Voids in hydrogenated amorphous silicon materials

Journal of Non-Crystalline Solids

Volumn 358, Issue 17, 2012, Pages 2023-2026

  Beyer, W ^a,b   Hilgers, W ^b   Prunici, P ^a   Lennartz, D ^b  

^a Malibu GmbH and Co KG   (Germany)

^b FORSCHUNGSZENTRUM JÜLICH   (Germany)

Author keywords

Amorphous silicon; Doping; Hydrogen; Microstructure; Voids

Indexed keywords

A-SI:H; CRYSTALLINE SI; CRYSTALLINE SILICONS; DIVACANCIES; DOPED MATERIALS; HOT WIRES; HYDROGEN CONCENTRATION; HYDROGEN CONTENTS; HYDROGENATED AMORPHOUS SILICON (A-SI:H); IMPLANTED HELIUM; SUBSTRATE TEMPERATURE; VOIDS;

AMORPHOUS SILICON; CRYSTALLINE MATERIALS; DOPING (ADDITIVES); HELIUM; HYDROGEN; HYDROGENATION; MICROSTRUCTURE;

SILICON;

EID: 84865771286     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2011.09.030     Document Type: Conference Paper

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