Anodic oxidation of tungsten in sulphuric acid solution-Influence of hydrofluoric acid addition

Materials Chemistry and Physics

Volumn 112, Issue 2, 2008, Pages 702-710

  Karastoyanov, Vasil ^a   Bojinov, Martin ^a  

^a UNIVERSITY OF CHEMICAL TECHNOLOGY AND METALLURGY   (Bulgaria)

Author keywords

Anodic films; Impedance spectroscopy; Oxides; Point defects; Sulphate fluoride electrolyte; Tungsten

Indexed keywords

ACIDS; CHEMICAL OXYGEN DEMAND; HYDROFLUORIC ACID; MOS CAPACITORS; OXIDATION; SULFURIC ACID; TUNGSTEN;

ANODIC FILMS; IMPEDANCE SPECTROSCOPY; OXIDES; POINT DEFECTS; SULPHATE-FLUORIDE ELECTROLYTE;

ANODIC OXIDATION;

EID: 53349129229     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matchemphys.2008.06.029     Document Type: Article

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