Tantalum and titanium doped In 2O 3 thin films by aerosol-assisted chemical vapor deposition and their gas sensing properties

Chemistry of Materials

Volumn 24, Issue 15, 2012, Pages 2864-2871

  Bloor, Leanne G ^a   Manzi, Joe ^a   Binions, Russell ^a,b   Parkin, Ivan P ^a   Pugh, David ^a   Afonja, Ayo ^a   Blackman, Christopher S ^a   Sathasivam, Sanjayan ^a   Carmalt, Claire J ^a  

^a UNIVERSITY COLLEGE LONDON   (United Kingdom)

^b QUEEN MARY UNIVERSITY OF LONDON   (United Kingdom)

Author keywords

CVD; gas sensing; indium oxide; tantalum doping; titanium doping

Indexed keywords

AEROSOL-ASSISTED CHEMICAL VAPOR DEPOSITIONS; CHEMICAL DEPOSITION; EFFECT OF DOPING; GAS RESPONSE; GAS SENSING; GAS SENSING PROPERTIES; GLASS SUBSTRATES; INDIUM OXIDE; REDUCING GAS; TITANIUM DOPED; WAVELENGTH DISPERSIVE;

ATMOSPHERIC AEROSOLS; CHEMICAL DETECTION; CHEMICAL VAPOR DEPOSITION; DEPOSITION; ETHANOL; GAS DETECTORS; GAS SENSING ELECTRODES; INDIUM; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR DOPING; SUBSTRATES; TANTALUM OXIDES; THIN FILMS; TITANIUM; TITANIUM OXIDES; X RAY DIFFRACTION;

TANTALUM;

EID: 84865151546     PISSN: 08974756     EISSN: 15205002     Source Type: Journal    
DOI: 10.1021/cm300596c     Document Type: Article

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