Aerosol assisted chemical vapor deposition using nanoparticle precursors: A route to nanocomposite thin films

Journal of the American Chemical Society

Volumn 128, Issue 5, 2006, Pages 1587-1597

  Palgrave, Robert G ^a   Parkin, Ivan P ^a  

^a UNIVERSITY COLLEGE LONDON   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

AEROSOLS; CHEMICAL VAPOR DEPOSITION; COLLOIDS; GOLD; METALLIC FILMS; SCANNING ELECTRON MICROSCOPY; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

GOLD COLLOIDS; PLASMON ABSORPTION; SEMICONDUCTOR NANOCOMPOSITE THIN FILMS; TUNGSTEN OXIDE MATRIX;

NANOSTRUCTURED MATERIALS;

GLASS; GOLD; NANOPARTICLE; SILICON DIOXIDE; TITANIUM DERIVATIVE; TOLUENE; TUNGSTEN DERIVATIVE;

ABSORPTION SPECTROSCOPY; AEROSOL; ARTICLE; COLLOID; CONCENTRATION (PARAMETERS); DENSITY; FILM; LIGHT; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR; SURFACE PLASMON RESONANCE; TECHNIQUE; VAPOR; X RAY ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 32244438584     PISSN: 00027863     EISSN: None     Source Type: Journal    
DOI: 10.1021/ja055563v     Document Type: Article

References (42)

1. The Royal Society and The Royal Academy of Engineering. Nanoscience and Nanotechnologies; The Royal Society of Chemistry: London, 2004.
2. Nanoparticles-from theory to applications; Schmid, G., Ed.; Wiley: New York, 2004.
3. Subramanian, V.; Wolf, E. E.; Kamat, P. V. J. Am. Chem. Soc. 2004, 126, 4943.
4. Ung, T.; Liz-Marzan, L. M.; Mulvaney, P. Colloids Surf., A: Physicochem. Eng. Aspects 2002, 202, 119.
5. Xu, X.; Stevens, M.; Cortie, M. B. Chem. Mater. 2004, 16, 2259.
6. Liu, Z.; Wang, H.; Li, H.; Wang, X. Appl. Phys. Lett. 1998, 72, 1823.
7. Mokari, T.; Sertchook, H.; Aharoni, A.; Ebenstein, Y.; Avnir, D.; Banin, U. Chem. Mater. 2005, 17, 258.
8. Naoi, K.; Ohko, Y.; Tatsuma, T. J. Am. Chem. Soc. 2004, 126, 3664.
9. Yang, C.; Kalwei, M.; Schuth, F.; Chao, K. Appl. Catal., A: Gen. 2003, 254, 289.
10. Lee, M.; Chae, L.; Lee, K. C. Nanostruct. Mater. 1999, 11, 195.
11. Lahiri, D.; Subramanian, V.; Shibata, T.; Wolf, E. E.; Bunker, B. A.; Kamat, P. V. J. Appl. Phys. 2003, 93, 2575.
12. Schimpf, S.; Lucas, M.; Mohr, C.; Rodemerck, U.; Bruckne, A.; Radnik, J.; Hofmeister, H.; Claus, P. Catal. Today 2002, 72, 63.
13. Hida, Y.; Kozuka, H. Thin Solid Films 2005, 476, 264.
14. He, T.; Ma, Y.; Cao, Y.; Yang, W.; Yao, J. Phys. Chem. Chem. Phys. 2002, 4, 1637.
15. He, T.; Ma, Y.; Cao, Y.; Yang, W.; Yao, J. J. Electroanal. Chem. 2001, 514, 129.
16. Tian, Y.; Tatsuma, T. Chem. Commun. 2004, 1810.
17. Stepanov, A. L.; Popok, V. N. Tech. Phys. Lett. 2003, 29, 977.
18. Fukumi, K.; Chayahara, A.; Kadono, K.; Sakaguchi, T.; Horino, Y. J. Appl. Phys. 1994, 75, 3075.
19. Stathatos, E.; Lianos, P.; Falaras, P.; Siokou, A. Langimuir 2000, 16, 2398.
20. Yang, Y.; Shi, J.; Huang, W.; Dai, S.; Wang, L. J. Mater. Sci. 2003, 38, 1243.
21. Epifani, M.; Giannini, C.; Tapfer, L.; Vasanelli, L. J. Am. Ceram. Soc. 2000, 83, 2385.
22. Deki, S.; Ko, H. Y. Y.; Fujita, T.; Akamatsu, K.; Mizuhata, M.; Kajinami, A. Eur. Phys. J. D 2001, 16, 325.
23. Qian, W.; Lin, L.; Deng, Y. L.; Xia, Z. J.; Zou, Y. H.; Wong, G. K. L. J. Appl. Phys. 2000, 87, 1.
24. Vepfek, S.; Reiprich, S. Thin Solid Films 1995, 26, 64.
25. Flahaut, E.; Agnoli, F.; Sloan, J.; O'Connor, C.; Green, M. L. H. Chem. Mater. 2002, 14, 2553.
26. Li, D.; Choi, C. J.; Kim, B. K.; Zhang, Z. D. J. Magn. Magn. Mater. 2004, 277, 64.
27. Wang, W.; Qu, L.; Yang, G.; Chen, Z. Appl. Surf. Sci. 2003, 218, 24.
28. Cross, W. B.; Parkin, I. P.; O'Neill, S. A.; Williams, D. A.; Mahon, M. F.; Molloy, K. C. Chem. Mater. 2003, 15, 2786.
29. Binions, R.; Carmalt, C. J.; Parkin, I. P. Thin Solid Films 2004, 469-470, 416.
30. Brust, M.; Walker, M.; Bethell, D.; Schiffrin, D. J.; Whyman, R. J. Chem. Soc., Chem. Commun. 1994, 801.
31. O'Neill, S. A.; Clark, R. J. H.; Parkin, I. P.; Elliott, N.; Mills, A. Chem. Mater. 2003, 15, 46.
32. Link, S.; El-Sayed, M. A. In Semiconductor and Metal Nanocrystals; Klimnov. V. I. Ed.; Marcel Dekker: New York, 2004: p 45.
33. For more information on the CIELAB color space system refer to http://www.de.co.at/cie (the Weh page of the CIE) or http://www. colourware.co.uk/cpfaq/q3-21.htm.
34. Dzhurinskii, B. F.; Gati, D.; Sergushin, N. P.; Nefedov, V. I.; Salyn, Y. A. V. Russ. J. Inorv.. Chem. 1975, 20, 2307.
35. Talhot, L.; Cheng, R. K.; Schefer, R. W.; Willis, D. R. J. Fluid Mech. 1980, 101, 737.
36. Palgrave, R. G.; Parkin, I. P. J. Mater. Chem. 2004, 14, 2864.
37. Kielbassa, S.; Kinne, M.; Behm, R. J. J. Phys. Chem. B 2004, 108, 19184.
38. Klar, T.; Perner, M.; Grosse, S.; von Plessen, G.; Spirkl, W.; Feldmann, J. Phys. Rev. Lett 1998, 80, 4249.
39. Barreras, F.; Amaveda, H.; Lozano, A. Exp. Fluids 2002, 33, 405.
40. Choy, K. L. Prog. Mater. Sci. 2003, 48, 57.
41. Brooks, A. R.; Clayton, C. R.; Doss, K.; Lu, Y. C. J. Electrochem. Soc. 1986, 2459.
42. Barber, D. J.; Freestone, I. C. Archaeometry 1990, 32, 33.