Ta-doped in2O3 transparent conductive films with high transmittance and low resistance

Optica Applicata

Volumn 40, Issue 1, 2010, Pages 25-31

  Wang, Biao ^a   Hu, Liming ^a   Liu, Fengmin ^b   Qin, Li ^a   Liu, Yun ^a   Wang, Lijun ^a  

^a CHANGCHUN INSTITUTE OF OPTICS   (China)

^b CHANGCHUN INSTITUTE OF APPLIED CHEMISTRY   (China)

Author keywords

In2O3; Sputtering; Thin films; Transparent conductive oxide

Indexed keywords

CRYSTALLOGRAPHIC DIRECTIONS; CUBIC STRUCTURE; FIELD EMISSION SCANNING ELECTRON MICROSCOPY; GLASS SUBSTRATES; HALL MEASUREMENTS; HIGH TRANSMITTANCE; IN2O3; LOW RESISTANCE; OPTICAL TRANSMISSION SPECTROSCOPY; OPTICAL TRANSMITTANCE; POLYCRYSTALLINE; RADIO-FREQUENCY SPUTTERING; ROOM TEMPERATURE; SPUTTERING POWER; TRANSPARENT CONDUCTIVE FILMS; TRANSPARENT CONDUCTIVE OXIDES;

CONDUCTIVE FILMS; ELECTRIC PROPERTIES; FIELD EMISSION; FIELD EMISSION MICROSCOPES; LIGHT TRANSMISSION; OPTICAL EMISSION SPECTROSCOPY; OPTICAL PROPERTIES; OXIDE FILMS; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; TANTALUM; THIN FILMS; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS;

OPTICAL FILMS;

EID: 77952048632     PISSN: 00785466     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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