Comparative microscopic and spectroscopic analysis of temperature-dependent growth of WO 3 and W 0.95Ti 0.05O 3 thin films

Journal of Materials Science

Volumn 47, Issue 18, 2012, Pages 6593-6600

  Manciu, Felicia S ^a   Yun, Young ^a   Durrer, William G ^a   Howard, James ^a   Schmidt, Ute ^b   Ramana, Chintalapalle V ^c  

^a UNIVERSITY OF TEXAS AT EL PASO   (United States)

^b WITec Wissenschaftliche Instrumente und Technologie GmbH   (Germany)

^c 500 W University Avenue   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AFM; DOPED MATERIALS; DOPED SAMPLE; EXPERIMENTAL CONDITIONS; LOWER FREQUENCIES; MAGNETRON REACTIVE SPUTTERING; MORPHOLOGY AND COMPOSITION; OXIDATION STATE; RADIO FREQUENCIES; RAMAN MEASUREMENTS; RAMAN PEAK; ROOM TEMPERATURE; SPECTROSCOPIC STUDIES; STRETCHING MODES; SUBSTRATE TEMPERATURE; TEMPERATURE DEPENDENT; TI DOPING; XPS DATA;

ATOMIC FORCE MICROSCOPY; GROWTH TEMPERATURE; PHOTOELECTRONS; RAMAN SPECTROSCOPY; SEMICONDUCTOR DOPING; SPECTROSCOPIC ANALYSIS; STOICHIOMETRY; SURFACE ROUGHNESS; X RAY PHOTOELECTRON SPECTROSCOPY;

THIN FILMS;

EID: 84864739534     PISSN: 00222461     EISSN: 15734803     Source Type: Journal    
DOI: 10.1007/s10853-012-6591-z     Document Type: Article

References (24)

1. Kalidindi NR, Bharathi KK, Ramana CV (2010) Appl Phys Lett 97:142107
2. Kalidindi NR, Manciu FS, Ramana CV (2011) ACS Appl Mater Interfaces 3:863
3. Manciu FS, Enriquez JL, Durrer WG, Yun Y, Ramana CV, SK Gullapalli SK (2010) Spectroscopic analysis of tungsten oxide thin films. J Mater Res 25:2401
4. Zhou L, Ren Q, Zhou X, Tang J, Chen Z, Yu C (2008) Microporous Mesoporous Mater 109:248
5. Boulova M, Lucazeau G (2002) J Solid State Chem 167:425
6. Ramana CV, Utsunomiya S, Ewing RC, Julien CM, Becker U (2006) J Phys Chem B 110:10430
7. Stankova M, Vilanova X, Calderer J, Llobet E, Brezmes J, Gracia I, Cane C, Correig X (2006) Sens Actuators, B 113:241
8. Lee SH, Cheong HM, Liu P, Smith D, Tracy CE, Mascarenhas A, Pitts JR, Deb SK (2001) Electrochim Acta 46:1995
9. Smith DJ, Vetelino JF, Falconer RS, Wittman EL (1993) Sens Actuators B Chem 13:264
10. Shen Y, Yamazaki T, Liu Z, Meng D, Kikuta T, Nakatani N (2009) Thin Solid Films 517:2069
11. Kanan SM, El-Kadri OM, Abu-Yousef IA, Kanan MC (2009) Sensors 9:8158
12. Pecquenard B, Lecacheux H, Livage J, Julien C (1998) J Solid State Chem 135:159
13. Shieh J, Feng HM, Hon MH, Juang HY (2002) Sens Actuators B 86:75
14. Sangaletti L, Depero LE, Sberveglieri G, Allieri B, Bontempi E, Groppelli S (1999) J Cryst Growth 198(199):1240
15. Gopel W, Reinhardt W (1996) Metal oxide sensors: new devices through tailoring interfaced on the atomic scale. In: Baltes H, Göpel W, Hesse J (eds) Sensors update sensor technologyapplication-markets, vol 1, VCH, Weinheim. ISBN 3-527-29329-9, p 49
16. Hu Y, Wang L, Li G (2007) Plasma Sci. Technol 9:452
17. Chai SY, Kim YJ, Lee WI (2006) J Electroceram 17:909
18. Depero LE, Gropelli S, Sora IN, Sangaletti L, Sberveglieri G, Tondello E (1996) J Solid State Chem 121:379
19. Hjelm A, Granqvist CG, Wills JM (1996) Phys Rev B 54:2436
20. Vemuri RS, Engelhard MH, Ramana CV (2012) ACS Appl Mater Interfaces 4:1371
21. Zhang WF, He YL, Zhang MS, Yin Z, Chen Q (2000) J Phys D Appl Phys 33:912
22. Locherer KR, Swainson IP, Salje EKH (1999) J Phys: Condens Matter 11:4143
23. Letheriotis G, Papaefthimiou S, Yianoulis P, Siokou A (2001) Thin Solid Films 384:298
24. Idriss H, Legare P, Maire G (2002) Surf Sci 515:413