Spectroscopic analysis of tungsten oxide thin films

Journal of Materials Research

Volumn 25, Issue 12, 2010, Pages 2401-2406

  Manciu, Felicia S ^a   Enriquez, Jose L ^a   Durrer, William G ^a   Yun, Young ^a   Ramana, Chintalapalle V ^b   Gullapalli, Satya K ^b  

^a UNIVERSITY OF TEXAS AT EL PASO   (United States)

^b 500 W University Avenue   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SAMPLES; CONFOCAL RAMAN; FILM SURFACES; HIGH TEMPERATURE; IR ABSORPTION; MONOCLINIC STRUCTURES; MORPHOLOGY AND COMPOSITION; OXYGEN CONTAMINATION; RADIO FREQUENCY MAGNETRON REACTIVE SPUTTERING; RAMAN SPECTRA; RAMAN TECHNIQUES; ROOM TEMPERATURE; STRAIN EFFECT; STRUCTURAL CHANGE; SUBSTRATE TEMPERATURE; TUNGSTEN OXIDE; TUNGSTEN OXIDE THIN FILMS; XPS;

ABSORPTION; MAGNETRONS; OXIDE FILMS; OXIDES; OXYGEN; RAMAN SCATTERING; RAMAN SPECTROSCOPY; SPECTROSCOPIC ANALYSIS; STOICHIOMETRY; THIN FILMS; TUNGSTEN; TUNGSTEN COMPOUNDS; X RAY PHOTOELECTRON SPECTROSCOPY;

ABSORPTION SPECTROSCOPY;

EID: 78649511584     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/jmr.2010.0294     Document Type: Article

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