Electrochromic properties of sputtered Ti-doped WO3 films

Plasma Science and Technology

Volumn 9, Issue 4, 2007, Pages 452-455

  Hu, Yuanrong ^a   Wang, Lige ^a   Li, Guoqing ^a  

^a DALIAN UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

Electrochromic; Magnetron sputtering; Plasma; Ti doped WO3 films

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELECTROCHROMISM; MAGNETRON SPUTTERING; PLASMAS; RAMAN SPECTROSCOPY; TITANIUM; TUNGSTEN;

CYCLIC CHRONOAMPEROMETRY; ELECTROCHROMIC PROPERTIES; ION INJECTION;

THIN FILMS;

EID: 38549157692     PISSN: 10090630     EISSN: None     Source Type: Journal    
DOI: 10.1088/1009-0630/9/4/15     Document Type: Article

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