Kinetic rates of thermal transformations and diffusion in polymer systems measured during sub-millisecond laser-induced heating

ACS Nano

Volumn 6, Issue 7, 2012, Pages 5830-5836

  Jung, Byungki ^a   Sha, Jing ^a   Paredes, Florencia ^a   Chandhok, Manish ^b   Younkin, Todd R ^b   Wiesner, Ulrich ^a   Ober, Christopher K ^a   Thompson, Michael O ^a  

^a School of Operations Research and Industrial Engineering   (United States)

^b INTEL CORPORATION   (United States)

Author keywords

acid diffusion; chemically amplified resists; laser spike annealing; side chain cleavage kinetics; submillisecond kinetics

Indexed keywords

ACID DIFFUSION; CHEMICALLY AMPLIFIED RESIST; CLEAVAGE KINETICS; DIFFUSION IN POLYMERS; KINETIC RATES; LASER-INDUCED HEATING; LIMITING TEMPERATURE; LOW-MOBILITY; MOBILITY OF REACTANTS; MODEL SYSTEM; ORDERS OF MAGNITUDE; SHORT TIME FRAMES; SMALL MOLECULES; SPIKE ANNEALING; TEMPERATURE REGIMES; TEMPERATURE STABILITY; TEMPERATURE-SENSITIVE; THERMAL TRANSFORMATIONS;

LASER HEATING; POLYMERS; PROBES; REACTION KINETICS;

KINETICS;

EID: 84864226092     PISSN: 19360851     EISSN: 1936086X     Source Type: Journal    
DOI: 10.1021/nn300008a     Document Type: Article

References (25)

1. Kodambaka, S.; Tersoff, J.; Teuter, M. C.; Ross, F. M. Germanium Nanowire Growth below the Eutectic Temperature Science 2007, 316, 729-732 (Pubitemid 46717677)
2. Ito, H. Chemical Amplification for Microlithography Adv. Polym. Sci. 2005, 172, 27-245
3. Lee, B. S.; Burr, G. W.; Shelby, R. M.; Raoux, S.; Rettner, C. T.; Bogle, S. N.; Darmawikarta, K.; Bishop, S. G.; Abelson, J. R. Observation of the Role of Subcritical Nuclei in Crystallization of a Glassy Solid Science 2009, 326, 980-984
4. Yamamoto, T.; Kubo, T.; Sukegawa, T.; Takii, E.; Shimamune, Y.; Tamura, N.; Sakoda, T.; Nakamura, M.; Ohta, H.; Miyashita, T. et al. Junction Profile Engineering with a Novel Multiple Laser Spike Annealing Scheme for 45-nm Node High Performance and Low Leakage CMOS Technology Int. Elec. Devices Meet. 2007, 1, 143-146
5. Fakhraai, Z.; Forrest, J. A. Measuring the Surface Dynamics of Glassy Polymers Science 2008, 319, 600-604 (Pubitemid 351197058)
6. Cameron, J. F.; Willson, C. G.; Fréchet, J. M. J. Photogeneration of Amines from α-Keto Carbamates: Photochemical Studies J. Am. Chem. Soc. 1996, 118, 12925-12937 (Pubitemid 27055295)
7. Kang, S.; Vogt, B. D.; Wu, W. L.; Prabhu, V. M.; VanderHart, D. L.; Rao, A.; Lin, E. K. Characterization of Compositional Heterogeneity in Chemically Amplified Photoresist Polymer Thin Films with Infrared Spectroscopy Macromolecules 2007, 40, 1497-1503 (Pubitemid 46423672)
8. Dektar, J. L.; Hacker, N. P. Photochemistry of Triarylsulfonium Salts J. Am. Chem. Soc. 1990, 112, 6004-6015
9. Vogt, B. D.; Kang, S.; Prabhu, V. M.; Lin, E. K.; Satija, S. K.; Turnquest, K.; Wu, W. L. Measurements of Reaction-Diffusion Front of Model Chemically Amplified Photoresists with Varying Photoacid Size Macromolecules 2006, 39, 8311-8317 (Pubitemid 46079670)
10. Lin, E. K.; Soles, C. L.; Goldfarb, D. L.; Trinque, B. C.; Burns, S. D.; Jones, R. L.; Lenhart, J. L.; Angelopoulos, M.; Willson, C. G.; Satija, S. K. et al. Direct Measurement of the Reaction Front in Chemically Amplified Photoresist Science 2002, 297, 372-375 (Pubitemid 34790761)
11. Kang, S.; Wu, W. L.; Choi, K. W.; Silva, A. D.; Ober, C. K.; Prabhu, V. M. Characterization of the Photoacid Diffusion Length and Reaction Kinetics in EUV Photoresists with IR Spectroscopy Macromolecules 2010, 43, 4275-4286
12. Thompson, L. F.; Willson, C. G.; Bowden, M. J. Introduction to Microlithography. ACS Professional Reference Book; American Chemical Society: Washington DC, 1994; pp 212-232.
13. Malik, S.; Eisele, J.; Whewell, A.; Ferreira, L.; Holt, T.; Bowden, M. Post-exposure Bake Temperature Considerations for High Activation Energy Resist Systems J. Photopolym. Sci. Technol. 2000, 13, 513-518
14. Ito, H.; Breyta, G.; Hofer, D.; Sooriyakumaran, R. Environmentally Stable Chemical Amplification Positive Resist: Principle, Chemistry, Contamination Resistance, and Lithographic Feasibility J. Photopolym. Sci. Technol. 1994, 7, 433-488
15. Benson, S. W. Thermochemical Kinetics: Methods for the Estimation of Thermochemical Data and Rate Parameters; John Wiley & Sons: New York, 1976; pp 17-320.
16. Chen, K.; Saltzman, E. J.; Schweizer, K. S. Molecular Theories of Segmental Dynamics and Mechanical Response in Deeply Supercooled Polymer Melts and Glasses Annu. Rev. Condens. Matter Phys. 1994, 1, 277-300
17. Wallraff, G; Hutchinson, J.; Hinsberg, W.; Houle, F.; Seidel, P.; Johnson, R. Oldham, W. Thermal and Acid-Catalyzed Deprotection Kinetics in Candidate Deep Ultraviolet Resist Materials J. Vac. Sci., Technol. B 1994, 12, 3857-3862
18. Hinsberg, W. D.; Houle, F. A.; Sanchez, M. I.; Wallraff, G. M. Chemical and Physical Aspects of the Post-exposure Baking Process used for Positive-Tone Chemically Amplified Resists IBM J. Res. Dev. 2001, 45, 667-682
19. Gusev, A. A.; Müller-Plathe, F.; van Gunsteren, M. F.; Suter, U. W. Dynamics of Small Molecules in Bulk Polymers Adv. Polym. Sci. 1994, 116, 207-247 (Pubitemid 24972342)
20. Williams, M. L.; Landel, R. F.; Ferry, J. D. The Temperature Dependence of Relaxation Mechanisms in Amorphous Polymers and Other Glass-Forming Liquids J. Am. Chem. Soc. 1955, 77, 3701-3707
21. Stewart, M. D.; Somervell, M. H.; Tran, H. V.; Postnikov, S. V.; Willson, C. G. Study of Acid Transport using IR Spectroscopy and SEM Proc. SPIE 2000, 3999, 665-679
22. Ferry, J. D. Viscoelastic Properties of Polymers; John Wiley & Sons: New York, 1980; pp 264-315.
23. Priestley, R. D.; Vroadbelt, L. J.; Torkelson, J. M.; Fukao, K. Glass Transition and α-Relaxation Dynamics of Thin Films of Labeled Polystyrene Phys. Rev. E 2007, 75, 061806
24. Bueche, F. Physical Properties of High Polymers; Interscience: New York, 1962; pp 90-93.
25. Iyengar, K.; Jung, B.; Willemann, M.; Clancy, P.; Thompson, M. O. Experimental Determination of Thermal Profiles during Laser Spike Annealing with Quantitative Comparison to 3-Dimensional Simulations Appl. Phys. Lett. 2012, 100, 211915-1-3