Electroanalytical performance of nitrogen-containing tetrahedral amorphous carbon thin-film electrodes

Analytical Chemistry

Volumn 84, Issue 14, 2012, Pages 6240-6248

  Yang, Xingyi ^a   Haubold, Lars ^a   Devivo, Gabriel ^a   Swain, Greg M ^a  

^a MICHIGAN STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BONDING RATIO; BORON DOPED DIAMOND; CARBON CONTENT; CVD DIAMOND; DEPOSITION CONDITIONS; ELECTRICAL RESISTIVITY; ELECTROANALYTICAL MEASUREMENTS; ELECTROANALYTICAL PERFORMANCE; ELECTRON TRANSFER KINETICS; LOW BACKGROUND; METHYLENE BLUE; MOLECULAR ADSORPTION; POLAR MOLECULES; POTENTIAL WINDOWS; PRE-TREATMENT; REDOX SYSTEMS; TETRAHEDRAL AMORPHOUS CARBON; TETRAHEDRAL AMORPHOUS CARBON (TA-C); THIN-FILM ELECTRODE; VOLTAMMETRIC CURRENTS;

ADSORPTION; AROMATIC COMPOUNDS; CARBON; CARBON FILMS; ELECTRIC CONDUCTIVITY; ELECTROCHEMICAL PROPERTIES; ELECTRODES; HYDROGEN; REDOX REACTIONS;

NITROGEN;

EID: 84863892056     PISSN: 00032700     EISSN: 15206882     Source Type: Journal    
DOI: 10.1021/ac301124r     Document Type: Article

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