Electrochemical properties of N-doped hydrogenated amorphous carbon films fabricated by plasma-enhanced chemical vapor deposition methods

Electrochimica Acta

Volumn 56, Issue 3, 2011, Pages 1172-1181

  Tanaka, Yoriko ^a   Furuta, Masahiro ^a   Kuriyama, Koichi ^a   Kuwabara, Ryosuke ^a   Katsuki, Yukiko ^a   Kondo, Takeshi ^b   Fujishima, Akira ^c   Honda, Kensuke ^a  

^a YAMAGUCHI UNIVERSITY   (Japan)

^b TOKYO UNIVERSITY OF SCIENCE   (Japan)

^c KANAGAWA ACADEMY OF SCIENCE AND TECHNOLOGY   (Japan)

Author keywords

Electrochemical properties; Nitrogen doped hydrogenated amorphous carbon; Plasma enhanced chemical vapor deposition

Indexed keywords

ATOMIC RATIO; BEFORE AND AFTER; BORON DOPED DIAMOND; CARBON AND NITROGEN SOURCES; CHARGE-TRANSFER RATE; CHEMICAL INERTNESS; DLC COATINGS; DOUBLE-LAYER CAPACITANCE; ELECTRICAL RESISTIVITY; ELECTROCHEMICAL ACTIVITIES; HIGH DURABILITY; HIGH RESISTANCE; HYDROGENATED AMORPHOUS CARBON; HYDROGENATED AMORPHOUS CARBON FILMS; INNER SURFACES; MICROWAVE-ASSISTED; N-DOPED; NITROGEN-DOPED; OPTICAL GAP; OXIDATIVE TREATMENT; PET BOTTLES; PHYSICAL STABILITY; POLARIZABLE ELECTRODES; POTENTIAL RANGE; POTENTIAL WINDOWS; REDOX SPECIES; STANDARD POTENTIAL; STRONG ACIDS; SURFACE OXIDATIONS;

AMORPHOUS CARBON; ASTATINE; BEVERAGES; BORON; CARBON FILMS; CERIUM; CERIUM COMPOUNDS; CHARGE TRANSFER; CHEMICAL STABILITY; DEPOSITION; ELECTRIC CONDUCTIVITY; ELECTROCHEMICAL ELECTRODES; ELECTROCHEMICAL PROPERTIES; HYDROCARBONS; HYDROGENATION; ION EXCHANGE; NITROGEN; NITROGEN PLASMA; OXIDATION; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; REDOX REACTIONS; SURFACES; THIN FILMS; VAPOR DEPOSITION;

AMORPHOUS FILMS;

EID: 78650513397     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2010.11.006     Document Type: Article

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