Semiconductor properties and redox responses at a-C:N thin film electrochemical electrodes

Diamond and Related Materials

Volumn 18, Issue 10, 2009, Pages 1211-1217

  Zeng, Aiping ^a   Bilek, Marcela M M ^a   McKenzie, David R ^a   Lay, Peter A ^b  

^a UNIVERSITY OF SYDNEY   (Australia)

^b UNIVERSITY OF SYDNEY   (Australia)

Author keywords

Electrochemical electrode; Nitrogen doped amorphous carbon; Redox responses; Semiconductor properties

Indexed keywords

ELECTRODE POTENTIALS; ELECTROLYTE SYSTEMS; HELMHOLTZ; INTRINSIC SEMICONDUCTORS; LOWER DENSITY; NITROGEN-DOPED; NITROGEN-DOPED AMORPHOUS CARBON; REDOX RESPONSE; REDOX RESPONSES; SEMICONDUCTOR PROPERTIES; SPACE CHARGES; SURFACE STATE;

AMORPHOUS CARBON; CAPACITANCE; ELECTROCHEMICAL PROPERTIES; ELECTROLYSIS; ELECTROLYTES; NITROGEN; REDOX REACTIONS;

ELECTROCHEMICAL ELECTRODES;

EID: 68749099425     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2009.04.003     Document Type: Article

References (30)

1. Zeng A., Bilek M.M.M., McKenzie D.R., Lay P.A., Fontaine A.L., and Keast V.J. Carbon 46 (2008) 663
2. Zeng A., Bilek M.M.M., McKenzie D.R., and Lay P.A. Diamond Relat. Mater. 18 (2009) 1102
3. McKenzie D.R., Yin Y., Marks N.A., Davis C.A., Pailthorpe B.A., Amaratunga G.A.J., and Veerasamy V.S. Diamond Relat. Mater. 3 (1994) 353
4. Memming R. Semiconductor Electrochemistry (2001), Wiley- VCH, Weinheim
5. Veerasamy V.S., Amaratunga G.A.J., Milne W.I., and Hewitt P. Diamond Relat. Mater. 2 (2003) 782
6. Veerasamy V.S., Amaratunga G.A.J., Davist C.A., Wilne W.I., Hewitt P., and Weiler M. Solid-State Electron. 37 (1994) 319
7. Ferrari A.C., Libassi A., Tanner B.K., Tanner B.K., Stolojan V., Yuan J., Brown L.M., Rodil S.E., Kleinsorge B., and Robertson J. Phys. Rev., B 62 (2000) 11089
8. Robertson J., and Davis C.A. Diamond Relat. Mater. 4 (1995) 441
9. Veerasamy V.S., Yuan J., Amaratunga G.A.J., Milne W.I., Gilkes K.W.R., Weider M., and Brown L.M. Phys. Rev., B 48 (1993) 17954
10. Kleinsorge B., Ferrari A.C., Robertson J., and Milne W.I. J. Appl. Phys. 88 (2000) 1149
11. Arena C., Kleinsorge B., Robertson J., Milne W.I., and Welland M.E. J. Appl. Phys. 85 (1999) 1609
12. Sze S.M. Semiconductor Devices: Physics and Technology (1985), John Wiley& Sons, New York
13. Memming R. In: Conway B.E., O'M Bokris J., Yeager E., Khan S.U.M., and White R.E. (Eds). Comprehensive Treatise of Electrochemistry vol. 7 (1983), Plenum Press, New York 529
14. Memming R., and Schwandt G. Angew. Chem., Int. Ed. Engl. 6 (1967) 851
15. Ponec V., Knor Z., and Cerny S. Adsorption on solids (1971), Butter Worth, London
16. Hamnett A. In: Compton R.G. (Ed). Comprehensive chemical kinetics vol. 27 (1987), Elsevier, London 91
17. Zeng A., Yin Y., Bilek M., and McKenzie D. Surf. Coat. Technol. 198 (2005) 202
18. A. Zeng, Electrochemistry of nitrogen doped amorphous carbon films, PhD thesis, The University of Sydney, 2008.
19. Memming R., and Schwandt G. Surf. Sci. 5 (1966) 97
20. Bohnenkamp K., and Engell H.-J. Zeit Elektrochem. 61 (1957) 1184
21. Weaver M.J. J. Phys. Chem. 100 (1996) 13079
22. Rieger P.H. Electrochemistry. Second edition (1994), Chapman & Hall, New York
23. Wang J. Analytical Electrochemistry. Second Edition (2001), Wiley-VCH, New York
24. Pleskov Y.V., Krotova M.D., Polyakov V.I., Khomich A.V., Rukovishnikov A.I., Druz B.L., and Zaritskiy I. J. Electroanal. Chem. 519 (2002) 60
25. Bortels L., Van den Bossche B., Deconinck J., Vandeputte S., and Hubin A. J. Electroanal. Chem. 429 (1997) 139
26. Wang R.L., Tam K.Y., and Compton R.G. J. Electroanal. Chem. 434 (1997) 105
27. Shi P., and Scherson D.A. Anal. Chem. 76 (2004) 2398
28. Sundberg K.M., and Smyrl W.H. J. Electrochem. Soc. 136 (1989) 434
29. Hu J., Yang P., and Lieber C.M. Phys. Rev., B 57 (1998) R3185
30. Zeng A., Liu E., Zhang S., Tan S.N., Hing P., Annergren I.F., and Gao J. Thin Solid Films 426 (2003) 258