Fabrication of micrometer-sized conical field emitters using femtosecond laser-assisted etching of silicon

Proceedings of the IEEE International Vacuum Microelectronics Conference, IVMC

Volumn , Issue , 2001, Pages 75-76

  Carey, J E ^a   Crouch, C H ^a   Younkin, R ^a   Mazur, E ^a   Sheehy, M ^b   Friend, C ^b  

^a HARVARD UNIVERSITY   (United States)

^b HARVARD UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANODES; CATHODES; CURRENT DENSITY; CURRENT VOLTAGE CHARACTERISTICS; ELECTRIC CURRENT MEASUREMENT; ETCHING; LASER BEAM EFFECTS; MICROSTRUCTURE; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS; ULTRASHORT PULSES; VOLTAGE MEASUREMENT;

FEMTOSECOND LASER-ASSISTED ETCHING; LASER IRRADIATION; MOCROMETER-SIZED CONICAL FIELD EMITTER;

ELECTRON EMISSION;

EID: 0035784812     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (5)

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