Pulsed rf-GD-TOFMS for depth profile analysis of ultrathin layers using the analyte prepeak region

Analytical and Bioanalytical Chemistry

Volumn 403, Issue 8, 2012, Pages 2437-2448

  Pisonero, J ^a   Valledor, R ^a   Licciardello, A ^b   Quiros C ^a   Martin J I ^a   Sanz Medel, A ^a   Bordel, N ^a  

^a UNIVERSITY OF OVIEDO   (Spain)

^b UNIVERSITY OF CATANIA   (Italy)

Author keywords

Afterglow; Analyte prepeak; Depth profile analysis; Glow discharge; Mass spectrometry; Nanometer layers; SIMS

Indexed keywords

AFTERGLOW; ANALYTE IONS; ANALYTES; BI-LAYER; DEPTH RESOLUTION; DEPTH-PROFILE ANALYSIS; DIRECT SOLID ANALYSIS; ION SIGNALS; MATRIX COMPOSITION; NANOMETER LAYERS; OXYGEN CONTAMINATION; POLYATOMICS; PRE-PEAK; PULSE TIME; RADIO FREQUENCIES; SI LAYER; SI SUBSTRATES; SPECTRAL INTERFERENCE; SPUTTERING PROCESS; TIME OF FLIGHT MASS SPECTROMETRY; TIME OF FLIGHT SECONDARY ION MASS SPECTROMETRY; ULTRA-THIN; ULTRATHIN LAYERS;

GLOW DISCHARGES; IONS; MASS SPECTROMETERS; MASS SPECTROMETRY; SECONDARY ION MASS SPECTROMETRY;

SILICON;

EID: 84863693292     PISSN: 16182642     EISSN: 16182650     Source Type: Journal    
DOI: 10.1007/s00216-011-5601-3     Document Type: Article

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