Fabrication and operation of a microcavity plasma array device for microscale surface modification

Plasma Processes and Polymers

Volumn 9, Issue 7, 2012, Pages 638-646

  Al Bataineh, Sameer A ^a   Szili, Endre J ^a   Gruner, Philipp J ^a   Priest, Craig ^a   Griesser, Hans J ^a   Voelcker, Nicolas H ^a,b   Short, Robert D ^a   Steele, David A ^a  

^a UNIVERSITY OF SOUTH AUSTRALIA   (Australia)

^b FLINDERS UNIVERSITY   (Australia)

Author keywords

atmospheric pressure glow discharges; microcavity plasma array device; plasma polymerisation; plasma treatment; XPS

Indexed keywords

ATMOSPHERIC PRESSURE GLOW DISCHARGE; HOMOGENEOUS SURFACES; MATERIALS PROCESSING; MICRO-SCALES; MICROCAVITY ARRAYS; MICROCAVITY PLASMA; MICROPATTERNS; MICROPLASMA TREATMENT; MICROSCALE FEATURES; MODIFICATION OF MATERIALS; NON-CONTACT; OCTADIENE; PLASMA POLYMERS; PLASMA TREATMENT; REGION OF INTEREST; ROI ANALYSIS; SILICON SUBSTRATES; SUBSTRATE SURFACE; SURFACE HYDRATION; TIME OF FLIGHT SECONDARY ION MASS SPECTROMETRY; TREATMENT TIME; VERSATILE METHODS; XPS IMAGING;

CHEMICAL MODIFICATION; METAMATERIALS; MICROCAVITIES; PHOTOELECTRONS; PLASMA DEPOSITION; PLASMA POLYMERIZATION; PLASMAS; POLYMERS; SECONDARY ION MASS SPECTROMETRY; SURFACE TREATMENT; X RAY PHOTOELECTRON SPECTROSCOPY;

PLASMA DEVICES;

EID: 84863683679     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.201100166     Document Type: Article

References (42)

1. K. H. Becker, K. H. Schoenbach, J. G. Eden, J. Phys. D Appl. Phys. 2006, 39, R55.
2. R. Foest, M. Schmidt, K. Becker, Int. J. Mass Spectrom. 2006, 248, 87.
3. F. Iza, G. J. Kim, S. M. Lee, J. K. Lee, J. L. Walsh, Y. T. Zhang, M. G. Kong, Plasma Process. Polym. 2008, 5, 322.
4. J. G. Eden, S. J. Park, K. S. Kim, Plasma Sources Sci. Technol. 2006, 15, S67.
5. S. J. Park, J. G. Eden, J. J. Ewing, Appl. Phys. Lett. 2002, 81, 4529.
6. P. von Allmen, D. J. Sadler, C. Jensen, N. P. Ostrom, S. T. McCain, B. A. Vojak, J. G. Eden, Appl. Phys. Lett. 2003, 82, 4447.
7. J. G. Eden, S. J. Park, Phys. Plasmas 2006, 13, 057101.
8. P. Siebert, G. Petzold, A. Hellenbart, J. Muller, Appl. Phys. A Mater. Sci. Process. 1998, 67, 155.
9. R. M. Sankaran, D. Holunga, R. C. Flagan, K. P. Giapis, Nano Lett. 2005, 5, 537.
10. E. J. Szili, S. A. Al-Bataineh, P. M. Bryant, R. D. Short, J. W. Bradley, D. A. Steele, Plasma Process. Polym. 2011, 8, 38.
11. K. Becker, A. Koutsospyros, S. M. Yin, C. Christodoulatos, N. Abramzon, J. C. Joaquin, G. Brelles-Marino, Plasma Phys. Control. Fusion 2005, 47, B513.
12. X. T. Deng, J. J. Shi, M. G. Kong, J. Appl. Phys. 2007, 101, 074701.
13. R. Rahul, O. Stan, A. Rahman, E. Littlefield, K. Hoshimiya, A. P. Yalin, A. Sharma, A. Pruden, C. A. Moore, Z. Yu, G. J. Collins, J. Phys. D Appl. Phys. 2005, 38, 1750.
14. R. Ogaki, M. Alexander, P. Kingshott, Mater. Today 2010, 13, 22.
15. C. Priest, Biomicrofluidics 2010, 4, 032206.
16. W. Peng, D. G. Castner, D. W. Grainger, J. Biomater. Sci. Polym. Ed. 2008, 19, 725.
17. C. Priest, P. J. Gruner, E. J. Szili, S. A. Al-Bataineh, J. W. Bradley, J. Ralston, D. A. Steele, R. D. Short, Lab Chip 2010, 11, 541.
18. L. Dai, H. J. Griesser, A. W. H. Mau, J. Phys. Chem. B 1997, 101, 9548.
19. A. Goessl, S. Gollendge, A. S. Hoffman, J. Biomater. Sci. Polym. Ed. 2001, 12, 721.
20. K. F. Chen, J. G. Eden, Appl. Phys. Lett. 2008, 93, 161501.
21. J. W. Frame, P. C. John, T. A. DeTemple, J. G. Eden, Appl. Phys. Lett. 1998, 72, 2634.
22. J. G. Eden, S. J. Park, N. P. Ostrom, S. T. McCain, C. J. Wagner, B. A. Vojak, J. Chen, C. Liu, P. von Allmen, F. Zenhausern, D. J. Sadler, C. Jensen, D. L. Wilcox, J. J. Ewing, J. Phys. D Appl. Phys. 2003, 36, 2869.
23. R. M. Sankaran, K. P. Giapis, J. Phys. D Appl. Phys. 2003, 36, 2914.
24. S. Kreitz, C. Penache, M. Thomas, C. P. Klages, Surf. Coat. Technol. 2005, 200, 676.
25. A. Möbius, D. Elbick, E.-R. Weidlich, K. Feldmann, F. Schüßler, J. Borris, M. Thomas, A. Zänker, C.-P. Klages, Electrochim. Acta 2009, 54, 2473.
26. S. Uwe, D. Antje, H. Paul, G. Andreas, T. Michael, K. Claus-Peter, R. Holger, Plasma Process. Polym. 2010, 7, 9.
27. C. Penache, C. Gessner, T. Betker, V. Bartels, A. Hollaender, C. P. Klages, IEE Proc. Nanobiotechnol. 2004, 151, 139.
28. B. A. Langowski, K. E. Uhrich, Langmuir 2005, 21, 10509.
29. N. Lucas, V. Ermel, M. Kurrat, S. Buttgenbach, J. Phys. D Appl. Phys. 2008, 41, 215202.
30. P. M. Bryant, E. J. Szili, T. Whittle, S.-J. Park, J. G. Eden, S. Al-Bataineh, D. A. Steele, R. D. Short, J. W. Bradley, Surf. Coat. Technol. 2010, 204, 2279.
31. S. A. Al-Bataineh, E. J. Szili, A. Mishra, S.-J. Park, J. G. Eden, H. J. Griesser, N. H. Voelcker, R. D. Short, D. A. Steele, Plasma Process. Polym. 2011, 8, 695.
32. High Resolution XPS of Organic Polymers, G. Beamson, D. Briggs, Eds., John Wiley and Sons, Chichester 1992.
33. R. M. France, R. D. Short, Langmuir 1998, 14, 4827.
34. K. F. Chen, N. P. Ostrom, S. J. Park, J. G. Eden, Appl. Phys. Lett. 2006, 88, 061121.
35. C.-P. Klages, A. Hinze, K. Lachmann, C. Berger, J. Borris, M. Eichler, M. von Hausen, A. Zänker, M. Thomas, Plasma Process. Polym. 2007, 4, 208.
36. U. Stöhr, A. Dohse, P. Hoppe, M. Thomas, K. Kadel, C.-P. Klages, H. Reinecke, Plasma Process. Polym. 2009, 6, 228.
37. R. M. France, R. D. Short, J. Chem. Soc. Faraday Trans. 1997, 93, 3173.
38. D. Barton, J. W. Bradley, K. J. Gibson, D. A. Steele, R. D. Short, J. Phys. Chem. B 2000, 104, 7150.
39. D. Barton, J. W. Bradley, D. A. Steele, R. D. Short, J. Phys. Chem. B 1999, 103, 4423.
40. The Characteristics of Electrical Discharges in Magnetic Fields, D. Bohm, Ed., McGraw Hill, New York and London 1949.
41. Z. Li, H. Li'an, Y. Linsong, Plasma Sci. Technol. 2003, 5, 1961.
42. M. J. Shenton, J. W. Bradley, J. A. van den Berg, D. G. Armour, G. C. Stevens, J. Phys. Chem. B 2005, 109, 22085.