Effect of selective area growth mask width on multi-quantum-well electroabsorption modulated lasers investigated by synchrotron radiation X-ray microprobe

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 284, Issue , 2012, Pages 6-9

  Mino, Lorenzo ^a   Agostino, Angelo ^a   Codato, Simone ^b   Martinez Criado, Gema ^c   Lamberti, Carlo ^a  

^a UNIVERSITY OF TURIN   (Italy)

^b BROADCOM CORPORATION   (United States)

^c EUROPEAN SYNCHROTRON RADIATION FACILITY   (France)

Author keywords

Electroabsorption modulated lasers; Multi quantum wells; Photoluminescence; Selective area growth; Synchrotron radiation; X ray microprobe

Indexed keywords

CHEMICAL COMPOSITIONS; CHIP-LEVEL; ELECTRO-ABSORPTION MODULATED LASER; EMPIRICAL APPROACH; FIBER COMMUNICATIONS; GROWTH PARAMETERS; HIGH FREQUENCY HF; MICRO-PROBES; MONOLITHIC INTEGRATION; MULTIQUANTUM WELLS; SELECTIVE AREA GROWTH; SELECTIVE AREA GROWTH TECHNIQUES; X RAY FLUORESCENCE; X-RAY SOURCES;

ELECTRONIC PROPERTIES; LIGHT TRANSMISSION; MICROMETERS; MONOLITHIC INTEGRATED CIRCUITS; OPTICAL LINKS; OPTOELECTRONIC DEVICES; PHOTOLUMINESCENCE; SYNCHROTRON RADIATION; THICKNESS MEASUREMENT; X RAYS;

SEMICONDUCTOR QUANTUM WELLS;

EID: 84863521961     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2011.09.009     Document Type: Article

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