Thickness dependence of buckling patterns of Ta films sputtered on glass substrates

Surface Review and Letters

Volumn 19, Issue 3, 2012, Pages

  Zhang, Yong Ju ^a   Yu, Sen Jiang ^b   Zhou, Hong ^b   Chen, Miao Gen ^b   Jiao, Zhi Wei ^b  

^a TAIZHOU UNIVERSITY   (China)

^b CHINA JILIANG UNIVERSITY   (China)

Author keywords

buckling; elastic properties; sputtering; stress; Thin film

Indexed keywords

BUCKLING PATTERNS; CONTINUUM ELASTIC THEORY; DIRECT CURRENT MAGNETRON SPUTTERING; ELASTIC PROPERTIES; GEOMETRICAL PARAMETERS; GLASS SUBSTRATES; RESIDUAL COMPRESSIVE STRESS; TA FILMS; THICKNESS DEPENDENCE;

MECHANICAL PROPERTIES; SPUTTERING; STRESSES; SUBSTRATES; TANTALUM; THIN FILMS;

BUCKLING;

EID: 84863491334     PISSN: 0218625X     EISSN: None     Source Type: Journal    
DOI: 10.1142/S0218625X12500229     Document Type: Article

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