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Journal of Nanoscience and Nanotechnology

Volumn 12, Issue 4, 2012, Pages 3696-3700

Al 2O 3/TiO 2 multilayer passivation layers grown at low temperature for flexible organic devices

(5) Kwon, Tae Suk a Moon, Dae Yong a Moon, Yeon Keon a Kim, Woong Sun a Park, Jong Wan a

Author keywords

Activation energy; Atomic layer deposition (ALD); Packing density; Passivation layer; Water vapor transmission rate (WVTR)

Indexed keywords

ALUMINUM OXIDES; ARRHENIUS-RATE EQUATIONS; DEPOSITION TEMPERATURES; LOW TEMPERATURES; LOW WATER; ORGANIC DEVICES; PACKING DENSITY; PASSIVATION BARRIER; PASSIVATION LAYER; PASSIVATION STRUCTURE; PLASMA POWER; POLYETHER SULFONE; TIO; WATER VAPOR TRANSMISSION; WATER VAPOR TRANSMISSION RATE;

ACTIVATION ENERGY; ALUMINUM; ELECTRON CYCLOTRON RESONANCE; ETHERS; PASSIVATION; REFRACTIVE INDEX; TITANIUM; TITANIUM DIOXIDE; VAPORS;

ATOMIC LAYER DEPOSITION;

EID: 84863334219 PISSN: 15334880 EISSN: 15334899 Source Type: Journal
DOI: 10.1166/jnn.2012.5663 Document Type: Conference Paper

Times cited : (16)

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