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Volumn 100, Issue 26, 2012, Pages

Understanding of the retarded oxidation effects in silicon nanostructures

Author keywords

[No Author keywords available]

Indexed keywords

COMPLEX BEHAVIOR; IN-DEPTH UNDERSTANDING; MECHANICAL STRESS; OXIDATION EFFECTS; OXIDATION KINETICS; OXIDATION PROCESS; PHYSICAL STRESS; RELAXATION EFFECT; SILICON NANOSTRUCTURES; SILICON NANOWIRES; WET THERMAL OXIDATIONS;

EID: 84863301290     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4729410     Document Type: Article
Times cited : (32)

References (19)
  • 15
    • 79961094977 scopus 로고    scopus 로고
    • 10.1146/annurev-conmatphys-062910-140152
    • M. L. Falk and J. S. Langer, Annu. Rev. 2, 353 (2011). 10.1146/annurev-conmatphys-062910-140152
    • (2011) Annu. Rev. , vol.2 , pp. 353
    • Falk, M.L.1    Langer, J.S.2
  • 16
    • 36849125005 scopus 로고
    • 10.1063/1.1749836
    • H. Eyring, J. Chem. Phys. 4, 283 (1936). 10.1063/1.1749836
    • (1936) J. Chem. Phys. , vol.4 , pp. 283
    • Eyring, H.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.