Thermally evaporated SiO thin films as a versatile interlayer for plasma-based OLED passivation

ACS Applied Materials and Interfaces

Volumn 4, Issue 6, 2012, Pages 3247-3253

  Yun, Won Min ^a   Jang, Jaeyoung ^a   Nam, Sooji ^a   Kim, Lae Ho ^a   Seo, Sang Joon ^b   Park, Chan Eon ^a  

^a Pohang University of Science and Technology (POSTECH)   (South Korea)

^b Sungkyunkwan University   (South Korea)

Author keywords

barrier property enhancement; organic light emitting diodes (OLEDs); passivation; protective interlayer; silicon monoxide (SiO); thin film encapsulation

Indexed keywords

BARRIER PROPERTIES; ORGANIC LIGHT EMITTING DIODES(OLEDS); PROTECTIVE INTERLAYER; SILICON MONOXIDE; THIN FILM ENCAPSULATION;

ALUMINUM; CHEMICAL VAPOR DEPOSITION; DEGRADATION; DEPOSITION; PASSIVATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMAS; SILICON OXIDES; THERMAL EVAPORATION; THIN FILMS; VAPORS;

ORGANIC LIGHT EMITTING DIODES (OLED);

EID: 84863201518     PISSN: 19448244     EISSN: 19448252     Source Type: Journal    
DOI: 10.1021/am300600s     Document Type: Article

References (23)

1. Tang, C. W.; Van Slyke, S. A. Appl. Phys. Lett. 1987, 51, 913-915
2. Gross, M.; Muller, D. C.; Nothofer, H. G.; Scherf, U.; Neher, D.; Brauchle, C.; Meerholz, K. Nature 2000, 405, 661-665
3. Brown, A. R.; Marks, R. N.; Mackay, K.; Friend, R. H.; Burns, P. L.; Holmes, A. B. Nature) 1990, 347, 539-541
4. Liao, K. OLED market outlook. Technical Report DisplaySearch; DisplaySearch: Santa Clara, CA, 2008
5. Burrows, P. E.; Bulovic, V.; Forrest, S. R.; Sapochak, L. S.; McCarty, D. M.; Thompson, M. E. Appl. Phys. Lett. 1994, 65, 2922-2924
6. Burrows, P. E.; Graff, G. L.; Gross, M. E.; Martin, P. M.; Shi, M. K.; Hall, M.; Mast, E.; Bonham, C.; Bennet, W.; Sullivan, M. B. Displays 2001, 22, 65-69
7. Lewis, S. J.; Weaver, S. M. IEEE J. Sel. Top. Quantum Electron. 2004, 10, 45-57
8. Sobrinho, A. S.; Czeremuszkin, G.; Latrache, M.; Wertheimer, M. R. J. Vac. Sci. Technol., A. 2000, 18, 149-157
9. Carcia, P F.; McLean, R. S.; Reilly, M. H.; Groner, M. D.; George, S. M. Appl. Phys. Lett. 2006, 89, 031915
10. Park, S. H.; Oh, J.; Hwang, C. S.; Lee, J. I.; Yang, Y. S.; Chu, H. Y. Electrochem. Solid-State Lett. 2005, 8, H21-H23
11. Langereis, E.; Creatore, M.; Heil, S. B. S.; Van de Sanden, M. C. M.; Kessels, W. M.M. Appl. Phys. Lett. 2006, 89, 081915
12. Carcia, P. F.; McLean, R. S.; Reilly, M. H.; Groner, M. D.; George, S. M. Appl. Phys. Lett. 2006, 89, 031915
13. Meyer, J.; Schneidenbach, D.; Winkler, T.; Hamwi, S.; Weimann, T.; Hinze, P.; Ammermann, S.; Johannes, H.; Riedl, T.; Kowalsky, W. Appl. Phys. Lett. 2009, 94, 233305
14. Meyer, J.; Gorrn, P.; Bertram, F.; Hamwi, S.; Winkler, T.; Johannes, H.; Weimann, T.; Hinze, P.; Riedl, T.; Kowalsky, W. Adv. Mater. 2009, 21, 1845-1849
15. Dameron, A.; Davidson, S.; Burton, B.; Carcia, P.; McLean, R.; George, S. M. J. Phys. Chem. C 2008, 112, 4573-4580
16. Dameron, A. A.; Saghete, D.; Burton, B. B.; Davison., S. D.; Cananagh, A. S.; Bertand, J. A.; George, S. M. Chem. Mater. 2008, 20, 3315-3326
17. Han, Y. C.; Jang, C.; Kim, K. J.; Choi, K. C.; Jung, K. H.; Bae, B. S. Org. Electron. 2011, 12, 609-613
18. Mattox, D. M. J. Vac. Sci. Technol. 1989, A 7, 1105-1114
19. Wong, F. L.; Fung, M. K.; Tao, S. L.; Lai, S. L.; Tsang, W. M.; Kong, K. H.; Choy, W. M.; Lee, C. S.; Lee, S. T. J. Appl. Phys. 2008, 104, 014509
20. Wang, X. Z.; Gao, X. D.; Zhou, Y. C.; Xie, Z. T.; Song, Q. L.; Ding, X. M.; Hou, X. Y. Thin Solid Films 2008, 516, 2171-2174
21. Graff, G. L.; Williford, R. E.; Burrows, P. E. J. Appl. Phys. 2004, 96, 1840-1849
22. Greener, J.; Ng, K. C.; Vaeth, K. M.; Smith, T. M. J. Appl. Polym. Sci. 2007, 106, 3534-3542
23. Ghosh, M. K.; Choi, C. H. Chem. Phys. Lett. 2006, 426, 365-369