Study on the deposition of aluminum-doped zinc oxide films using direct-current pulse magnetron reactive sputtering technique

Wuli Xuebao/Acta Physica Sinica

Volumn 61, Issue 3, 2012, Pages

  Chen, Chao ^a   Ji, Yong ^a   Gao, Xiao Yong ^a   Zhao, Meng Ke ^a   Ma, Jiao Min ^a   Zhang, Zeng Yuan ^a   Lu, Jing Xiao ^a  

^a ZHENGZHOU UNIVERSITY   (China)

Author keywords

AZO film; Direct current pulse magnetron reactive sputtering; Gas flow ratio of oxygen to argon; Optical properties

Indexed keywords

EID: 84863157495     PISSN: 10003290     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (20)

1. Robert F 1997 Science 276 890.
2. Song D, Aberle A G, Xia J 2002 Appl. Surf. Sci. 195 291.
3. Vanheusden K, Warren W L, Seager C H, Tallant D R, Voigh J A, Gnade B E 1996 J. Appl. Phys. 79 7983.
4. Chopra K L, Major S, Pandya D K 1983 Thin Solid Films 102 1.
5. Granqvist C G 1990 Thin Solid Films 730 193.
6. Kluth O, Schöpe G, Hüpkes J, Agashe C, Müller J, Rech B 2003 Thin Solid Films 442 80.
7. Zhang D H, Brod D E 1995 Acta Phys. Sin. 44 1321 (in Chinese).
8. Kim K H, Park K C, Ma D Y 1997 J. Appl. Phys. 81 7764.
9. Major C, Nemeth A, Radnoczi G, Czigany Z, Fried M, Labadi Z, Barsony I 2009 Appl. Surf. Sci. 255 8907.
10. Hong R J, Jiang X 2006 Appl. Phys. A 84 161.
11. Deng Z H, Huang C G, Huang J Q, Wang M L, He H, Wang H, Cao Y G 2010 J. Mater. Sci.-Mater. Electron. 21 1030.
12. Gao X Y, Lin Q G, Feng H L, Liu Y F, Lu J X 2009 Thin Solid Films 517 4684.
13. Sahu D R, Lin S Y, Huang J L 2007 Appl. Surf. Sci. 253 4886.
14. Chen M, Bai X D, Huang R F, Wen L S 2000 Chin. J. Semicond. 21 394 (in Chinese).
15. Kim H, Piqueb A, Horwitzb J S, Murata H, Kafafi Z H, Gilmore C M, Chrisey D B 2000 Thin Solid Films 377-378 798.
16. Segmuller A, Murakami M, Rosenberg R 1988 Analytical Techniques for Thin Films (Boston: Academic Press) p143.
17. Cebulla R, Wendi R, Ellmer K 1998 J. Appl. Phys. 83 1087.
18. Mi X C, Chen Y Y, Wu Z J, Liu X H, Yang S Y, Zhang L C 2004 PARTA: Physical Testing 40 181 (in Chinese).
19. Gao X Y, Liu X W, Feng H L, Lu J X 2010 J. Zhengzhou Univ. (Nat. Sci. Ed.) 42 51(in Chinese).
20. Yim K, Kim H, Lee C 2006 J. Electroceram. 17 875.