Direct photopatternable organic-inorganic hybrid materials as a low dielectric constant passivation layer for thin film transistor liquid crystal displays

Journal of Physical Chemistry C

Volumn 115, Issue 50, 2011, Pages 25056-25062

  Jung, Yangho ^a   Yeo, Tae Hoon ^a,b   Yang, Wooseok ^a   Kim, Youngwoo ^a   Woo, Kyoohee ^a   Moon, Jooho ^a  

^a Yonsei University   (South Korea)

^b Dongjin Semichem Co Ltd   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CROSSLINKING REACTION; HIGH-APERTURE; LOW CONCENTRATIONS; LOW DIELECTRIC CONSTANTS; METHOXYMETHYL; ORGANIC-INORGANIC HYBRID MATERIALS; PASSIVATION LAYER; SILANOL GROUPS; SOL-GEL REACTION; TETRA-ETHYL-ORTHO-SILICATE; TFT-LCDS; THIN FILM TRANSISTOR LIQUID CRYSTAL DISPLAYS; WATER VAPOR PERMEABILITY;

CROSSLINKING; LIQUID CRYSTAL DISPLAYS; MELAMINE FORMALDEHYDE RESINS; PASSIVATION; SOL-GELS; THIN FILM TRANSISTORS;

HYBRID MATERIALS;

EID: 84863143891     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp2075258     Document Type: Article

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