![]() |
Volumn 44, Issue 20, 2003, Pages 6235-6239
|
New positive-type photosensitive polyimide having sulfo groups
|
Author keywords
Photosensitive polyimide; Sulfo group; Tetramethylammonium hydroxide
|
Indexed keywords
HEAT TREATMENT;
PHOTORESISTS;
PHOTOSENSITIVITY;
PHOTOSENSITIVE COMPOUND;
POLYIMIDES;
ANILINE DERIVATIVE;
BENZENE DERIVATIVE;
META CRESOL;
NAPHTHALENE DERIVATIVE;
PHTHALIC ACID DERIVATIVE;
POLYIMIDE;
SULFONIC ACID DERIVATIVE;
SULFUR DERIVATIVE;
TETRAMETHYLAMMONIUM;
AQUEOUS SOLUTION;
ARTICLE;
CYCLIZATION;
HEAT TREATMENT;
PHOTOREACTIVITY;
RING OPENING;
ROOM TEMPERATURE;
SYNTHESIS;
ULTRAVIOLET RADIATION;
POLYMER;
|
EID: 0042194514
PISSN: 00323861
EISSN: None
Source Type: Journal
DOI: 10.1016/S0032-3861(03)00636-0 Document Type: Article |
Times cited : (21)
|
References (12)
|