New positive-type photosensitive polyimide having sulfo groups

Polymer

Volumn 44, Issue 20, 2003, Pages 6235-6239

  Morita, Kosuke ^a   Ebara, Kazuya ^a   Shibasaki, Yuji ^a   Ueda, Mitsuru ^a   Goto, Kenichi ^b   Tamai, Souji ^b  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^b MITSUI CHEMICALS INC   (Japan)

Author keywords

Photosensitive polyimide; Sulfo group; Tetramethylammonium hydroxide

Indexed keywords

HEAT TREATMENT; PHOTORESISTS; PHOTOSENSITIVITY;

PHOTOSENSITIVE COMPOUND;

POLYIMIDES;

ANILINE DERIVATIVE; BENZENE DERIVATIVE; META CRESOL; NAPHTHALENE DERIVATIVE; PHTHALIC ACID DERIVATIVE; POLYIMIDE; SULFONIC ACID DERIVATIVE; SULFUR DERIVATIVE; TETRAMETHYLAMMONIUM;

AQUEOUS SOLUTION; ARTICLE; CYCLIZATION; HEAT TREATMENT; PHOTOREACTIVITY; RING OPENING; ROOM TEMPERATURE; SYNTHESIS; ULTRAVIOLET RADIATION;

POLYMER;

EID: 0042194514     PISSN: 00323861     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0032-3861(03)00636-0     Document Type: Article

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