Nano-tribological properties of topographically undulated nanocrystalline diamond patterns

Journal of Nanoscience and Nanotechnology

Volumn 11, Issue 1, 2011, Pages 344-349

  Kim, J H ^a   Lee, S K ^a   Hwang, K S ^a   Kwon, O M ^a   Lim, D S ^a  

^a Korea University   (South Korea)

Author keywords

Diamond patterns; Lateral force nanocrystalline; Nano tribology

Indexed keywords

AFM; ATTRITION MILLING; CVD DIAMOND; DIAMOND GROWTH; DIAMOND SURFACES; E-BEAM LITHOGRAPHY; ELECTROSTATIC SELF ASSEMBLY; FRICTION COEFFICIENTS; HIGH COEFFICIENT-OF-FRICTION; LATERAL FORCE; LATERAL FORCE MICROSCOPY; LIFT-OFF PROCESS; LINE-AND-SPACE PATTERNS; LOW FRICTION COEFFICIENTS; NANO DIAMOND; NANO-DIAMOND PARTICLES; NANOCRYSTALLINE DIAMOND COATINGS; NANOCRYSTALLINE DIAMOND FILMS; NANOCRYSTALLINE DIAMONDS; NANOCRYSTALLINES; PATTERNED SURFACE; SEEDING LAYERS; SILICON OXIDE SURFACES; SPACE PATTERNS; SURFACE PROFILING; WEAR TEST;

ATOMIC FORCE MICROSCOPY; DIAMONDS; FRICTION; MECHANICAL ENGINEERING; MECHANICS; RAMAN SPECTROSCOPY; SILICON COMPOUNDS; SILICON OXIDES; SURFACE ROUGHNESS;

NANODIAMONDS;

EID: 84863015970     PISSN: 15334880     EISSN: None     Source Type: Journal    
DOI: 10.1166/jnn.2011.3214     Document Type: Conference Paper

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