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Volumn 18, Issue 10, 2009, Pages 1218-1222
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Thickness controlled and smooth polycrystalline CVD diamond film deposition on SiO2 with electrostatic self assembly seeding process
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Author keywords
Electrostatic self assembly; Hot filament CVD; Nano diamond; Thickness control
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Indexed keywords
COATED SURFACE;
CVD DIAMOND FILMS;
DIAMOND PARTICLES;
ELECTROSTATIC SELF ASSEMBLY;
ELECTROSTATIC SELF-ASSEMBLY METHODS;
HIGH DENSITY;
HOT FILAMENT CVD;
INCUBATION TIME;
LINEAR GROWTH RATE;
MECHANICAL DAMAGES;
MONO-DISPERSED;
NANO DIAMOND;
POLYCRYSTALLINE CVD DIAMOND;
SEEDING LAYERS;
SEEDING PROCESS;
SUBMICROMETERS;
THICKNESS UNIFORMITY;
VISIBLE FRINGES;
CHEMICAL VAPOR DEPOSITION;
DIAMOND CUTTING TOOLS;
DIAMOND DEPOSITS;
DIAMONDS;
ELECTROSTATICS;
FILAMENTS (LAMP);
OXIDE FILMS;
SELF ASSEMBLY;
SILICON COMPOUNDS;
SILICON OXIDES;
SURFACE ROUGHNESS;
THICKNESS CONTROL;
DIAMOND FILMS;
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EID: 68749095726
PISSN: 09259635
EISSN: None
Source Type: Journal
DOI: 10.1016/j.diamond.2009.04.012 Document Type: Article |
Times cited : (31)
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References (15)
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