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Volumn 18, Issue 10, 2009, Pages 1218-1222

Thickness controlled and smooth polycrystalline CVD diamond film deposition on SiO2 with electrostatic self assembly seeding process

Author keywords

Electrostatic self assembly; Hot filament CVD; Nano diamond; Thickness control

Indexed keywords

COATED SURFACE; CVD DIAMOND FILMS; DIAMOND PARTICLES; ELECTROSTATIC SELF ASSEMBLY; ELECTROSTATIC SELF-ASSEMBLY METHODS; HIGH DENSITY; HOT FILAMENT CVD; INCUBATION TIME; LINEAR GROWTH RATE; MECHANICAL DAMAGES; MONO-DISPERSED; NANO DIAMOND; POLYCRYSTALLINE CVD DIAMOND; SEEDING LAYERS; SEEDING PROCESS; SUBMICROMETERS; THICKNESS UNIFORMITY; VISIBLE FRINGES;

EID: 68749095726     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2009.04.012     Document Type: Article
Times cited : (31)

References (15)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.