Low-temperature growth of multi-walled carbon nanotubes by thermal CVD

Physica Status Solidi (B) Basic Research

Volumn 248, Issue 11, 2011, Pages 2500-2503

  Halonen, Niina ^a   Sápi, András ^b   Nagy, László ^b   Puskás, Róbert ^b   Leino, Anne Riikka ^a   Mäklin, Jani ^a   Kukkola, Jarmo ^a   Tóth, Geza ^a   Wu, Ming Chung ^c   Liao, Hsueh Chung ^c   Su, Wei Fang ^c   Shchukarev, Andrey ^d   Mikkola, Jyri Pekka ^d   Kukovecz, Ákos ^b   Kónya, Zoltán ^b   Kordás, Krisztián ^a,d  

^a UNIVERSITY OF OULU   (Finland)

^b UNIVERSITY OF SZEGED   (Hungary)

^c NATIONAL TAIWAN UNIVERSITY   (Taiwan)

^d UMEÅ UNIVERSITY   (Sweden)

Author keywords

Low temperature CNT growth; Thermal CVD

Indexed keywords

ACETYLENE; ALUMINA; ALUMINUM OXIDE; BINARY ALLOYS; CATALYST ACTIVITY; CHEMICAL VAPOR DEPOSITION; COBALT ALLOYS; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; IRON ALLOYS; LIGHTING; METHANOL; NANOCATALYSTS; NANOTUBES; SCANNING ELECTRON MICROSCOPY; SILICA; TEMPERATURE; TERNARY ALLOYS; X RAY PHOTOELECTRON SPECTROSCOPY; XYLENE;

CONVENTIONAL HYDROCARBONS; DIFFERENT PRECURSORS; LOW TEMPERATURE GROWTH; LOW TEMPERATURES; MONOMETALLIC CATALYSTS; SCANNING AND TRANSMISSION ELECTRON MICROSCOPY; THERMAL CHEMICAL VAPOR DEPOSITION; THERMAL CVD;

MULTIWALLED CARBON NANOTUBES (MWCN);

EID: 84862982506     PISSN: 03701972     EISSN: 15213951     Source Type: Journal    
DOI: 10.1002/pssb.201100137     Document Type: Article

References (32)

1. K. Mukhopadhyay, A. Koshio, T. Sugai, N. Tanaka, H. Shinohara, Z. Konya, and J. B. Nagy, Chem. Phys. Lett. 303, 117 (1999).
2. B. Q. Wei, R. Vajtai, Y. Jung, J. Ward, R. Zhang, G. Ramanath, and P. M. Ajayan, Nature 416, 495 (2002).
3. Y. J. Jung, B. Wei, R. Vajtai, P. M. Ajayan, Y. Homma, K. Prabhakaran, and T. Ogino, Nano Lett. 3(4), 561 (2003).
4. G. Meng, Y. J. Jung, A. Cao, R. Vajtai, and P. M. Ajayan, Proc. Natl. Acad. Sci. USA 102(20), 7074 (2005).
5. K. Mizuno, K. Hata, T. Saito, S. Ohsima, M. Yumura, and S. Iijima, J. Phys. Chem. B 109, 2632 (2005).
6. J. K. Radhakrishnan, P. S. Pandian, V. C. Padaki, H. Bhuan, K. U. B. Rao, J. Xie, J. K. Abraham, and V. K. Varadan, Appl. Surf. Sci. 255, 6325 (2009).
7. J. Jiang, T. Feng, X. Cheng, L. Dai, G. Cao, B. Jiang, X. Wang, X. Liu, and S. Zou, Nucl. Instrum. Methods Phys. Res. B 244, 327 (2006).
8. J. Jiang, T. Feng, J. H. Zhang, X. H. Cheng, G. B. Chao, B. Y. Jiang, Y. J. Wang, X. Wang, X. H. Liu, and S. C. Zou, Appl. Surf. Sci. 252, 2938 (2006).
9. N. Halonen, K. Kordás, G. Tóth, T. Mustonen, J. Mäklin, J. Vähäkangas, P. M. Ajayan, and R. Vajtai, J. Phys. Chem. C 112(17), 6723 (2008).
10. S. Hofmann, B. Kleinsorge, C. Ducati, A. C. Ferrari, and J. Robertson, Diamond Relat. Mater. 13, 1171 (2004).
11. S. Hofmann, C. Ducati, B. Kleinsorge, and J. Robertson, Appl. Phys. Lett. 83(22), 4661 (2003).
12. K. Y. Lee, M. Katayama, S. Honda, T. Kuzuoka, T. Miyake, Y. Terao, J.-G. Lee, H. Mori, T. Hirao, and K. Oura, Jpn. J. Appl. Phys. 42, L804 (2003).
13. H. S. Kang, H. J. Yoon, C. O. Kim, J. P. Hong, I. T. Han, S. N. Cha, B. K. Song, J. E. Jung, N. S. Lee, and J. M. Kim, Chem. Phys. Lett. 349, 196 (2001).
14. S.-C. Chang, T.-C. Lin, T.-S. Li, and S.-H. Huang, Microelectron. J. 39, 1572 (2008).
15. N. Chiodarelli, Y. Li, D. J. Cott, S. Mertens, N. Peys, M. Heyns, S. De Gendt, G. Groeseneken, and P.M. Vereecken, Microelectron. Eng. 88, 837 (2011).
16. M. Dubosc, S. Casimirius, M.-P. Besland, C. Cardinaud, A. Granier, J.-L. Duvail, A. Gohier, T. Minéa, V. Arnal, and J. Torres, Microelectron. Eng. 84, 2501 (2007).
17. E. J. Bae, Y.-S. Min, D. Kang, J.-H. Ko, and W. Park, Chem. Mater. 17(20), 5141 (2005).
18. W.-H. Chiang and R.M. Sankaran, Adv.Mater. 20, 4857 (2008).
19. M. Cantoro, S. Hofmann, S. Pisana, V. Scardaci, A. Parvez, C. Ducati, A. C. Ferrari, A. M. Blackburn, K.-Y. Wang, and J. Robertson, Nano Lett. 6, (6), 1107 (2006).
20. T.-Y. Tsai, N.-H. Tai, K. C. Chen, S. H. Lee, L. H. Chan, and Y. Y. Chang, Diamond Relat. Mater. 18, 307 (2009).
21. M. Phaner-Goutorbe, A. Sartre, and L. Porte, Microsc. Microanal. Microstruct. 5, 283 (1994).
22. P. Atkins and J. de Paula, Atkins' Physical Chemistry, eighth edition (Oxford University Press, Italy, 2006), p. 1012.
23. Y. Xiao, J. M. Longo, G. B. Hieshima, and R. J. Hill, Ind. Eng. Chem. Res. 36, 4033 (1997).
24. G. Glockler, J. Phys. Chem. 62(9), 1049 (1958).
25. D. R. Lide, CRC Handbook of Chemistry and Physics, 72nd edition (CRC Press, Boca Raton, USA, 1991).
26. N. Nagaraju, A. Fonseca, Z. Konya, and J. B. Nagy, J. Mol. Catal. A 181, 57 (2002).
27. Á. Kukovecz, Z. Kónya, N. Nagaraju, I. Willems, A. Tamási, A. Fonseca, J. B. Nagy, and I. Kiricsi, Phys. Chem. Chem. Phys. 2, 3071 (2000).
28. A. M. Cassell, J. A. Raymakers, J. Kong, and H. Dai, J. Phys. Chem. B 103, 6484 (1999).
29. W. Q. Deng, X. Xu, and W. A. Goddard III, Nano Lett. 4, 2331 (2004).
30. T. Zaki, J. Colloid Interface Sci. 284, 606 (2005).
31. K. Hata, D. N. Futaba, K. Mizuno, T. Namai, M. Yumura, and S. Iijima, Science 306, 1362 (2004).
32. D. N. Futaba, K. Hata, T. Yamada, K. Mizuno, M. Yumura, and S. Iijima, Phys. Rev. Lett. 95, 056104 (2005).