Characterization upon electrical hysteresis and thermal diffusion of tial 3o x dielectric film

Nanoscale Research Letters

Volumn 6, Issue , 2011, Pages 1-6

  Shi, Lei ^a   Liu, Zhiguo ^b  

^a UNIVERSITY OF SCIENCE AND TECHNOLOGY OF CHINA   (China)

^b NANJING UNIVERSITY   (China)

Author keywords

Electrical hysteresis; Pulsed laser deposition; Thermal diffusion

Indexed keywords

CAPACITANCE VOLTAGE MEASUREMENTS; DIFFUSION ACTIVATION ENERGY; DIFFUSION BEHAVIOR; DIFFUSION MODEL; ELECTRICAL GATES; ELECTRICAL HYSTERESIS; INTERFACIAL REGION; METAL ATOMS; OXIDE SYSTEMS; POST ANNEALING TREATMENT; PSEUDO-BINARIES; SIMPLE METHOD;

ACTIVATION ENERGY; DIELECTRIC FILMS; HYSTERESIS; PULSED LASER DEPOSITION; PULSED LASERS; THERMAL DIFFUSION; TITANIUM ALLOYS; TITANIUM COMPOUNDS;

ELECTRIC PROPERTIES;

EID: 84862909286     PISSN: 19317573     EISSN: 1556276X     Source Type: Journal    
DOI: 10.1186/1556-276X-6-557     Document Type: Article

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