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Volumn 6, Issue 6, 2012, Pages 4615-4628

Bottom-up SiO 2 embedded carbon nanotube electrodes with superior performance for integration in implantable neural microsystems

Author keywords

bottom up SiO 2 embedding; brain insertion; charge injection; CNT electrodes; electrode impedance; neural probes

Indexed keywords

BOTTOM-UP SIO 2 EMBEDDING; CARBON NANOTUBE ELECTRODES; CHEMICAL FINGERPRINT; CMOS PROCESSING; CURRENT PULSE; CURRENT PULSING; ELECTRODE IMPEDANCE; GAS EVOLUTION; IMPEDANCE MONITORING; LOW TEMPERATURES; MECHANICAL INTEGRITY; MICROELECTRODE ARRAY; NEURAL MICROSYSTEMS; NEURAL PROBES; PARYLENE C; RAT BRAIN; TIN ELECTRODES; VERTICALLY ALIGNED; WAFER-SCALE;

EID: 84862896126     PISSN: 19360851     EISSN: 1936086X     Source Type: Journal    
DOI: 10.1021/nn201609u     Document Type: Article
Times cited : (21)

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