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Volumn 3, Issue 4, 2011, Pages 925-930

Electroplate and lift lithography for patterned micro/nanowires using ultrananocrystalline diamond (UNCD) as a reusable template

Author keywords

electrochemically deposited semiconductors; electrode patterning; metamaterials; nontraditional lithography; patterned nanowires; UNCD films

Indexed keywords

COMPLEX PATTERN; ELECTROCHEMICAL SYNTHESIS; ELECTROCHEMICALLY DEPOSITED SEMICONDUCTORS; NANO SCALE; NONTRADITIONAL LITHOGRAPHY; PATTERNED NANOWIRES; REUSABLE TEMPLATES; SCALE DEVELOPMENT; SEMICONDUCTING NANOWIRES; ULTRANANOCRYSTALLINE DIAMONDS; UNCD FILMS;

EID: 84862833417     PISSN: 19448244     EISSN: 19448252     Source Type: Journal    
DOI: 10.1021/am101226w     Document Type: Article
Times cited : (13)

References (31)
  • 31
    • 84879791120 scopus 로고    scopus 로고
    • Atlanta, GA; NSF CMMI Program: Washington, D.C.,; Grant 0954656. Portions of the literature review were adapted from the NSF conference proceedings.
    • Zach, M. P. Proceedings of NSF Engineering Research and Innovation Conference; Atlanta, GA; NSF CMMI Program: Washington, D.C., 2011; Grant 0954656. Portions of the literature review were adapted from the NSF conference proceedings.
    • (2011) Proceedings of NSF Engineering Research and Innovation Conference
    • Zach, M.P.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.