Raman and XPS characterization of vanadium oxide thin films deposited by reactive RF sputtering

Solar Energy Materials and Solar Cells

Volumn 56, Issue 3-4, 1999, Pages 249-258

  Cazzanelli, E ^a   Mariotto, G ^b   Passerini, S ^c   Smyrl, W H ^c   Gorenstein, A ^d  

^a UNIVERSITY OF CALABRIA   (Italy)

^b UNIVERSITY OF TRENTO   (Italy)

^c UNIVERSITY OF MINNESOTA   (United States)

^d UNIVERSITY OF CAMPINAS   (Brazil)

Author keywords

Raman and XPS characterization; RF sputtering; Vanadium oxide thin films

Indexed keywords

CRYSTAL STRUCTURE; LIGHT POLARIZATION; OPTICAL FILMS; RAMAN SPECTROSCOPY; SPUTTER DEPOSITION; STOICHIOMETRY; THIN FILMS; VANADIUM COMPOUNDS; X RAY PHOTOELECTRON SPECTROSCOPY;

VANADIUM OXIDE;

ELECTROOPTICAL MATERIALS;

EID: 0032736968     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0927-0248(98)00135-4     Document Type: Article

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