Electrical and optical properties of nanostructured VOX thin films prepared by direct current magnetron reactive sputtering and post-annealing in oxygen

Thin Solid Films

Volumn 519, Issue 19, 2011, Pages 6203-6207

  Luo, Zhenfei ^a   Wu, Zhiming ^a   Xu, Xiangdong ^a   Wang, Tao ^a   Jiang, Yadong ^a  

^a UNIVERSITY OF ELECTRONIC SCIENCE AND TECHNOLOGY OF CHINA   (China)

Author keywords

Electrical properties; Magnetron reactive sputtering; Nanostructured vanadium oxide; Optical properties; Post oxidation annealing

Indexed keywords

ABSOLUTE VALUES; ABSORPTION EDGES; AMBIENT OXYGEN; AS-DEPOSITED FILMS; DIRECT-CURRENT MAGNETRONS; ELECTRICAL AND OPTICAL PROPERTIES; ELECTRICAL STUDIES; FIELD EMISSION SCANNING ELECTRON MICROSCOPES; IN-SITU ANNEALING; MAGNETRON REACTIVE SPUTTERING; NANO-STRUCTURED; NANOSTRUCTURED VANADIUM OXIDE; OPTICAL INVESTIGATION; OXYGEN ANNEALING; OXYGEN ATMOSPHERE; POST ANNEALING; POST-OXIDATION; RED SHIFT; TEMPERATURE COEFFICIENT OF RESISTANCE; UV-VISIBLE; VANADIUM OXIDES;

ACTIVATION ENERGY; AMORPHOUS FILMS; ANNEALING; ELECTRIC PROPERTIES; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MAGNETRONS; OPTICAL PROPERTIES; OXIDE FILMS; OXIDES; OXYGEN; PHOTOELECTRON SPECTROSCOPY; REACTIVE SPUTTERING; SCANNING ELECTRON MICROSCOPY; THIN FILMS; VANADIUM; VANADIUM ALLOYS; VANADIUM COMPOUNDS; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

FILM PREPARATION;

EID: 79958206578     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2011.03.003     Document Type: Article

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