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Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 27, Issue 6, 2009, Pages 1316-1319

Zn-doped CuAlS2 transparent p-type conductive thin films deposited by pulsed plasma deposition

(5) Yang, Ming a Wang, Yinghua a Li, Guifeng a Shi, Zhan a Zhang, Qun a

a FUDAN UNIVERSITY (China)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS STRUCTURES; APPLIED VOLTAGES; ELECTRICAL PROPERTY; FORWARD CURRENTS; P-TYPE; PULSED PLASMA DEPOSITION; REVERSE CURRENTS; SUBSTRATE TEMPERATURE; TURN ON VOLTAGE; TYPICAL SAMPLES; VISIBLE RANGE;

AMORPHOUS FILMS; CARRIER CONCENTRATION; CARRIER MOBILITY; CHEMICAL VAPOR DEPOSITION; CONDUCTIVE FILMS; DEPOSITION; DIFFRACTION; DISTILLATION; ELECTRIC PROPERTIES; HOLOGRAPHIC INTERFEROMETRY; OPTICAL PROPERTIES; PLASMA DEPOSITION; THIN FILMS; ZINC;

CURRENT VOLTAGE CHARACTERISTICS;

EID: 71049118142 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.3244565 Document Type: Article

Times cited : (9)

References (25)

1
- 28144454446
- 0960-8974, 10.1016/j.pcrysgrow.2005.10.001
- A. N. Banerjee and K. K. Chattopadhyay, Prog. Cryst. Growth Charact. Mater. 0960-8974 50, 52 (2005). 10.1016/j.pcrysgrow.2005.10.001
- (2005) Prog. Cryst. Growth Charact. Mater. , vol.50 , pp. 52
- Banerjee, A.N.¹ Chattopadhyay, K.K.²

2
- 0031258719
- 2
- DOI 10.1038/40087
- H. Kawazoe, M. Yasukawa, H. Hyodo, M. Kurita, H. Yanagi, and H. Hosono, Nature (London) 0028-0836 389, 939 (1997). 10.1038/40087 (Pubitemid 27485678)
- (1997) Nature , vol.389 , Issue.6654 , pp. 939-942
- Kawazoe, H.¹ Yasukawa, M.² Hyodo, H.³ Kurita, M.⁴ Yanagi, H.⁵ Hosono, H.⁶

3
- 0035875389
- 10.1063/1.1372636
- R. Nagarajan, A. D. Draeseke, A. W. Sleight, and J. Tate, J. Appl. Phys. 89, 8022 (2001). 10.1063/1.1372636
- (2001) J. Appl. Phys. , vol.89 , pp. 8022
- Nagarajan, R.¹ Draeseke, A.D.² Sleight, A.W.³ Tate, J.⁴

4
- 0000835706
- 2 thin films on sapphire (001) substrates by pulsed laser deposition
- DOI 10.1063/1.1337587
- K. Ueda, T. Hase, H. Yanagi, H. Kawazoe, and H. Hosono, J. Appl. Phys. 0021-8979 89, 1790 (2001). 10.1063/1.1337587 (Pubitemid 33630004)
- (2001) Journal of Applied Physics , vol.89 , Issue.3 , pp. 1790-1793
- Ueda, K.¹ Hase, T.² Yanagi, H.³ Kawazoe, H.⁴ Hosono, H.⁵ Ohta, H.⁶ Orita, M.⁷ Hirano, M.⁸

5
- 0035848195
- 0003-6951, 10.1063/1.1355673
- H. Yanagi, T. Hase, S. Ibuki, K. Ueda, and H. Hosono, Appl. Phys. Lett. 0003-6951 78, 1583 (2001). 10.1063/1.1355673
- (2001) Appl. Phys. Lett. , vol.78 , pp. 1583
- Yanagi, H.¹ Hase, T.² Ibuki, S.³ Ueda, K.⁴ Hosono, H.⁵

6
- 0001405142
- 0003-6951, 10.1063/1.1289906
- N. Duan, A. W. Sleight, M. K. Jayaraj, and J. Tate, Appl. Phys. Lett. 0003-6951 77, 1325 (2000). 10.1063/1.1289906
- (2000) Appl. Phys. Lett. , vol.77 , pp. 1325
- Duan, N.¹ Sleight, A.W.² Jayaraj, M.K.³ Tate, J.⁴

7
- 10944258669
- 2
- DOI 10.1021/cm048982k
- B. J. Ingram, B. J. Harder, N. W. Hrabe, T. O. Mason, and K. Poeppelmeier, Chem. Mater. 0897-4756 16, 5623 (2004). 10.1021/cm048982k (Pubitemid 40019071)
- (2004) Chemistry of Materials , vol.16 , Issue.26 , pp. 5623-5629
- Ingram, B.J.¹ Harder, B.J.² Hrabe, N.W.³ Mason, T.O.⁴ Poeppelmeier, K.R.⁵

8
- 34548444596
- CuB O2: A p -type transparent oxide
- DOI 10.1063/1.2778755
- M. Snure and A. Tiwari, Appl. Phys. Lett. 0003-6951 91, 092123 (2007). 10.1063/1.2778755 (Pubitemid 47352308)
- (2007) Applied Physics Letters , vol.91 , Issue.9 , pp. 092123
- Snure, M.¹ Tiwari, A.²

9
- 0000241979
- 2: A p-type conductive oxide with wide band gap
- DOI 10.1063/1.121761, PII S0003695198018282
- A. Kudo H. Yanagi, H. Hosono, and H. Kawazoe, Appl. Phys. Lett. 0003-6951 73, 220 (1998). 10.1063/1.121761 (Pubitemid 128673732)
- (1998) Applied Physics Letters , vol.73 , Issue.2 , pp. 220-222
- Kudo, A.¹ Yanagi, H.² Hosono, H.³ Kawazoe, H.⁴

10
- 0000730835
- 0003-6951, 10.1063/1.1319507
- K. Ueda, S. Inoue, H. Hirose, H. Kawazoe, and H. Hosono, Appl. Phys. Lett. 0003-6951 77, 2701 (2000). 10.1063/1.1319507
- (2000) Appl. Phys. Lett. , vol.77 , pp. 2701
- Ueda, K.¹ Inoue, S.² Hirose, H.³ Kawazoe, H.⁴ Hosono, H.⁵

11
- 1542375024
- 0003-6951, 10.1063/1.1646221
- H. Kamioka, H. Hidenori, H. Ohta, M. Hirano, K. Ueda, T. Kamiya, and H. Hosono, Appl. Phys. Lett. 0003-6951 84, 879 (2004). 10.1063/1.1646221
- (2004) Appl. Phys. Lett. , vol.84 , pp. 879
- Kamioka, H.¹ Hidenori, H.² Ohta, H.³ Hirano, M.⁴ Ueda, K.⁵ Kamiya, T.⁶ Hosono, H.⁷

12
- 0027866818
- 0040-6090, 10.1016/0040-6090(93)90636-4
- H. Sato, T. Minami, S. Takata, and T. Yamada, Thin Solid Films 0040-6090 236, 27 (1993). 10.1016/0040-6090(93)90636-4
- (1993) Thin Solid Films , vol.236 , pp. 27
- Sato, H.¹ Minami, T.² Takata, S.³ Yamada, T.⁴

13
- 17144450356
- Fabrication of the low-resistive p-type ZnO by codoping method
- DOI 10.1016/S0921-4526(01)00419-7, PII S0921452601004197
- M. Joseph, H. Tabata, H. Saeki, K. Ueda, and T. Kawai, Physica B 0921-4526 302-303, 140 (2001). 10.1016/S0921-4526(01)00419-7 (Pubitemid 32551294)
- (2001) Physica B: Condensed Matter , vol.302-303 , pp. 140-148
- Joseph, M.¹ Tabata, H.² Saeki, H.³ Ueda, K.⁴ Kawai, T.⁵

14
- 1242285028
- 0003-6951, 10.1063/1.1644331
- J. M. Bian, X. M. Li, X. D. Gao, W. D. Yu, and L. D. Chen, Appl. Phys. Lett. 0003-6951 84, 541 (2004). 10.1063/1.1644331
- (2004) Appl. Phys. Lett. , vol.84 , pp. 541
- Bian, J.M.¹ Li, X.M.² Gao, X.D.³ Yu, W.D.⁴ Chen, L.D.⁵

15
- 8644222175
- 0003-6951, 10.1063/1.1803935
- J. G. Lu, Z. Z. Ye, F. Zhuge, Y. J. Zeng, B. H. Zhao, and L. P. Zhu, Appl. Phys. Lett. 0003-6951 85, 3134 (2004). 10.1063/1.1803935
- (2004) Appl. Phys. Lett. , vol.85 , pp. 3134
- Lu, J.G.¹ Ye, Z.Z.² Zhuge, F.³ Zeng, Y.J.⁴ Zhao, B.H.⁵ Zhu, L.P.⁶

16
- 79956007988
- 2 films
- DOI 10.1063/1.1485133
- S. Park, D. A. Keszler, M. M. Valencia, R. L. Hoffman, J. P. Bender, and J. F. Wager, Appl. Phys. Lett. 0003-6951 80, 4393 (2002). 10.1063/1.1485133 (Pubitemid 34720501)
- (2002) Applied Physics Letters , vol.80 , Issue.23 , pp. 4393
- Park, S.¹ Keszler, D.A.² Valencia, M.M.³ Hoffman, R.L.⁴ Bender, J.P.⁵ Wager, J.F.⁶

17
- 34548842217
- 2+x with wide band gap
- DOI 10.1016/j.scriptamat.2007.08.015, PII S1359646207005994
- M. L. Liu, Y. M. Wang, F. Q. Huang, L. D. Chen, and W. D. Wang, Scr. Mater. 1359-6462 57, 1133 (2007). 10.1016/j.scriptamat.2007.08.015 (Pubitemid 47446387)
- (2007) Scripta Materialia , vol.57 , Issue.12 , pp. 1133-1136
- Liu, M.-L.¹ Wang, Y.-M.² Huang, F.-Q.³ Chen, L.-D.⁴ Wang, W.-D.⁵

18
- 33847110205
- 2
- DOI 10.1063/1.2591415
- M. L. Liu, F. Q. Huang, L. D. Chen, Y. M. Wang, Y. H. Wang, G. F. Li, and Q. Zhang, Appl. Phys. Lett. 0003-6951 90, 072109 (2007). 10.1063/1.2591415 (Pubitemid 46280695)
- (2007) Applied Physics Letters , vol.90 , Issue.7 , pp. 072109
- Liu, M.-L.¹ Huang, F.-Q.² Chen, L.-D.³ Wang, Y.-M.⁴ Wang, Y.-H.⁵ Li, G.-F.⁶ Zhang, Q.⁷

19
- 31144473566
- 3: Mo thin films deposited by Channel Spark Ablation
- DOI 10.1116/1.1991871
- L. Huang, X. F. Li, Q. Zhang, W. N. Miao, L. Zhang, X. J. Yan, Z. J. Zhang, and Z. Y. Hua, J. Vac. Sci. Technol. A 0734-2101 23, 1350 (2005). 10.1116/1.1991871 (Pubitemid 43126780)
- (2005) Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films , vol.23 , Issue.5 , pp. 1350-1353
- Huang, L.¹ Li, X.-F.² Zhang, Q.³ Miao, W.-N.⁴ Zhang, L.⁵ Yan, X.-J.⁶ Zhang, Z.-J.⁷ Hua, Z.-Y.⁸

20
- 0029373584
- 0257-8972, 10.1016/0257-8972(95)08308-1
- Th. Witke, A. Lenk, B. Schultrich, and C. Schultheiss, Surf. Coat. Technol. 0257-8972 74-75, 580 (1995). 10.1016/0257-8972(95)08308-1
- (1995) Surf. Coat. Technol. , vol.7475 , pp. 580
- Witke, Th.¹ Lenk, A.² Schultrich, B.³ Schultheiss, C.⁴

21
- 0001266679
- 0021-8979, 10.1063/1.371802
- S. D. Kovaleski, R. M. Gilgenbach, L. K. Ang, and Y. Y. Lau, J. Appl. Phys. 0021-8979 86, 7129 (1999). 10.1063/1.371802
- (1999) J. Appl. Phys. , vol.86 , pp. 7129
- Kovaleski, S.D.¹ Gilgenbach, R.M.² Ang, L.K.³ Lau, Y.Y.⁴

22
- 71049175072
- JCPDS Card No. 75-0100.
- JCPDS Card No. 75-0100.

23
- 33646202250
- 0096-8250, 10.1103/PhysRev.93.632
- E. Burstein, Phys. Rev. 0096-8250 93, 632 (1954). 10.1103/PhysRev.93.632
- (1954) Phys. Rev. , vol.93 , pp. 632
- Burstein, E.¹

24
- 33748602391
- 3 thin films
- DOI 10.1116/1.2333572
- X. F. Li, Q. Zhang, W. N. Miao, L. Huang, Z. J. Zhang, and Z. Y. Hua, J. Vac. Sci. Technol. A 0734-2101 24, 1866 (2006). 10.1116/1.2333572 (Pubitemid 44376091)
- (2006) Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films , vol.24 , Issue.5 , pp. 1866-1869
- Li, X.¹ Zhang, Q.² Miao, W.³ Huang, L.⁴ Zhang, Z.⁵ Hua, Z.⁶

25
- 34547407200
- 3:Mo/Si heterostructure
- DOI 10.1088/0268-1242/22/8/013, PII S0268124207476192, 013
- X. Zhang, Q. Zhang, and F. Lu, Semicond. Sci. Technol. 0268-1242 22, 900 (2007). 10.1088/0268-1242/22/8/013 (Pubitemid 47160528)
- (2007) Semiconductor Science and Technology , vol.22 , Issue.8 , pp. 900-904
- Zhang, X.¹ Zhang, Q.² Lu, F.³

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