SCOPUS 정보 검색 플랫폼

Review of Scientific Instruments

Volumn 83, Issue 5, 2012, Pages

Stencil mask methodology for the parallelized production of microscale mechanical test samples

(4) Shade, Paul A a Kim, Sang Lan b Wheeler, Robert b Uchic, Michael D a

a AIR FORCE RESEARCH LABORATORY (United States)

b UES INC (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BULK MATERIALS; BULK SUBSTRATES; DEEP REACTIVE ION ETCHING; FABRICATION METHOD; FABRICATION TECHNIQUE; HIGH ASPECT RATIO; ION BEAM MILLING; MASK PATTERNS; MICROELECTRONIC PROCESS; MICROMECHANICAL TESTS; MICROSCALE MECHANICAL TEST; POLYCRYSTALLINE; SI STENCIL MASKS; STENCIL MASKS;

ASPECT RATIO; FABRICATION; MASKS; MICROELECTRONICS; PHOTOLITHOGRAPHY; SILICON WAFERS;

SUBSTRATES;

EID: 84862152693 PISSN: 00346748 EISSN: None Source Type: Journal
DOI: 10.1063/1.4720944 Document Type: Review

Times cited : (14)

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