High-intensity near-field generation for silicon nanoparticle arrays with oblique irradiation for large-area high-throughput nanopatterning

Applied Physics B: Lasers and Optics

Volumn 107, Issue 2, 2012, Pages 323-332

  Miyanishi, T ^a   Tsunoi, Y ^a   Terakawa, M ^a   Obara, M ^a  

^a KEIO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC PERMITTIVITIES; FINITE-DIFFERENCE TIME-DOMAIN (FDTD) METHODS; GOLD NANOPARTICLES; GOLD-NANOPARTICLE ARRAYS; HIGH-THROUGHPUT; NANOPARTICLE ARRAY; NANOPARTICLE SYSTEMS; NANOPATTERNING; NEAR FIELDS; NEAR-FIELD; NEAR-FIELD DISTRIBUTION; OBLIQUE IRRADIATION; OPTICAL CHARACTERISTICS; OPTICAL FIELD ENHANCEMENT; OPTICAL FIELD INTENSITY; PARTICLE ARRANGEMENTS; S-POLARIZED; SI SUBSTRATES; SILICA NANOPARTICLES; SILICON NANOPARTICLES; SILICON SUBSTRATES;

FINITE DIFFERENCE TIME DOMAIN METHOD; IRRADIATION; METAL NANOPARTICLES; PERMITTIVITY; SILICA;

SUBSTRATES;

EID: 84861825404     PISSN: 09462171     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00340-012-4995-8     Document Type: Article

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