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Applied Physics A: Materials Science and Processing

Volumn 99, Issue 1, 2010, Pages 39-46

Size parameter effect of dielectric small particle mediated nano-hole patterning on silicon wafer by femtosecond laser

(5) Sakai, Tetsuo a Tanaka, Yuto a Nishizawa, Yuji a Terakawa, Mitsuhiro a Obara, Minoru a

a KEIO UNIVERSITY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

FEMTO-SECOND LASER; FEMTOSECONDS; HOLE DIAMETER; LASER FLUENCES; NANOHOLES; POLYSTYRENE PARTICLE; SIZE PARAMETERS; SMALL PARTICLES; TI: SAPPHIRE LASER; ULTRAVIOLET REGION;

FINITE DIFFERENCE TIME DOMAIN METHOD; POLYSTYRENES; PULSED LASER APPLICATIONS; SILICON WAFERS;

SEMICONDUCTING SILICON COMPOUNDS;

EID: 77953538678 PISSN: 09478396 EISSN: 14320630 Source Type: Journal
DOI: 10.1007/s00339-010-5576-5 Document Type: Article

Times cited : (24)

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