Global and local planarization of surface roughness by chemical vapor deposition of organosilicon polymer for barrier applications

Journal of Applied Physics

Volumn 111, Issue 7, 2012, Pages

  Coclite, Anna Maria ^a   Gleason, Karen K ^a,b  

^a USA   (United States)

^b NONE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACRYLIC MONOMERS; BUILDING MATERIALS; CURING; FLEXIBLE ELECTRONICS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASTIC COATINGS; POLYSTYRENES; SCANNING ELECTRON MICROSCOPY; SILICON COMPOUNDS; SUBSTRATES; SURFACE ROUGHNESS;

ATOMIC FORCE MICROGRAPHS; BARRIER LAYER DEPOSITION; CHEMICAL VAPOR DEPOSITIONS (CVD); CROSS-SECTIONAL SCANNING; GLOBAL PLANARIZATIONS; ORGANOSILICON MONOMERS; ORGANOSILICON POLYMERS; POLYSTYRENE MICRO-SPHERE;

PLASMA CVD;

EID: 84861749554     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3702428     Document Type: Conference Paper

References (24)

1. M. S. Weaver, L. A. Michalski, K. Rajan, Appl. Phys. Lett. 81, 2929 (2002). 10.1063/1.1514831
2. J. Lewis, Mat. Today 9, 38 (2006). 10.1016/S1369-7021(06)71446-8
3. S. Cros, R. de Bettignies, S. Berson, Sol. Energy Mat. Solar C 95, S65 (2011). 10.1016/j.solmat.2011.01.035
4. A. S. Da-Silva-Sobrinho, G. Czeremuskin, M. Latrche, J. Vac. Sci. Technol. A 18, 2021 (2000). 10.1116/1.582156
5. A. G. Erlat, B. M. Henry, J. J. Ingram, Thin Solid Films 388, 78 (2001). 10.1016/S0040-6090(01)00836-7
6. J. S. G. Ling and G. J. Leggett, Polymer 38, 2617 (1997). 10.1016/S0032-3861(97)85594-2
7. B. Cros, M. F. Vallat, and G. Despaux, Appl. Surf. Sci. 126, 159 (1997). 10.1016/S0169-4332(97)00597-7
8. W. A. MacDonald, J Mater. Chem. 14, 4 (2004). 10.1039/b310846p
9. D. G. Shaw and M. G. Langlois, Proceedings of the Society of Vacuum Coaters, 45th Annual Technical Conference (1994), p. 240.
10. M. Roehrig, D. Shaw, M. Langlois, J Plastic Film Sheeting 13, 235 (1997). 10.1177/875608799701300307
11. M. Yan, T. W. Kim, A. G. Erlat, Proc. IEEE 93, 1468 (2005). 10.1109/JPROC.2005.851483
12. J. D. Affinito, M. E. Gross, C. A. Coronado, Thin Solid Films 290-291, 63 (1996). 10.1016/S0040-6090(96)09202-4
13. J. D. Affinito, S. Eufinger, M. E. Gross, Thin Solid Film 308-9, 19 (1997). 10.1016/S0040-6090(97)00531-2
14. A. Hass Bar-Ilan and N. Gutmann, SPIE 2636, 277 (2002). 10.1117/12.221142
15. D. E. Bornside, R. A. Brown, S. Mittal, Appl. Phys. Lett. 58, 1181 (1991). 10.1063/1.104358
16. S. W. Pang and M. W. Horm, J. Vac. Sci. Technol. B 8, 1980 (1990). 10.1116/1.584887
17. A. M. Coclite and K. K. Gleason, Plasma Proc. Polym., Initiated PECVD of Organosilicon Coatings: A New Strategy to Enhance Monomer Structure Retention, (submitted).
18. K. K. S. Lau and K. K. Gleason, Macromolecules 39, 3688 (2006); 10.1021/ma0601619 K. K. S. Lau and K. K. Gleason, Macromolecules 39, 3695 (2006). 10.1021/ma0601621
19. O. Spindler and B. Neureither, Thin Solid Films 175, 67 (1989); 10.1016/0040-6090(89)90810-9 N. Suzuki, K. Masu, K. Tsubouchi, N. Mikoshiba, Jpn. J. Appl. Phys. 29, L 2341 (1990). 10.1143/JJAP.29.L2341
20. G. Rabilloud, High-Performance Polymers (TECHNIP, Paris, 2000), Vol. 3.
21. W. V. Ohnesorge, J. Appl. Math. Mech. 16 (6), 355 (1936). 10.1002/zamm.19360160611
22. R. Cuerno and L. Vazquez, Universality Issues in Surface Kinetic Roughening of Thin Solid Films (Nova Science, New York, 2004).
23. S. H. Baxamusa and K. K. Gleason, Chem. Vap. Deposition 14, 313 (2008). 10.1002/cvde.200806713
24. G. Ozaydin-Ince and K. K. Gleason, Chemical Vapor Deposition 16, 100 (2010). 10.1002/cvde.200906821