Facile size-tunable fabrication of functional tin dioxide nanostructures by multiple size reduction lithography

ACS Applied Materials and Interfaces

Volumn 4, Issue 5, 2012, Pages 2507-2514

  Park, Hyeong Ho ^a   Law, Wai Lung ^b,d   Zhang, Xin ^b   Hwang, Seon Yong ^a   Jung, Sang Hyun ^a   Shin, Hyun Beom ^a   Kang, Ho Kwan ^a   Park, Hyung Ho ^c   Hill, Ross H ^b   Ko, Chul Ki ^a  

^a Korea Advanced Nano Fab Center (KANC)   (South Korea)

^b SIMON FRASER UNIVERSITY   (Canada)

^c Yonsei University   (South Korea)

^d HONG KONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Hong Kong)

Author keywords

nanoimprint lithography; photochemical mechanism; size reduction lithography; Tin dioxide

Indexed keywords

ANNEALING TEMPERATURES; BIOLOGICAL SENSORS; FINE STRUCTURES; MODEL CATALYSTS; PHOTOCHEMICAL MECHANISM; SIZE REDUCTION LITHOGRAPHY; SURFACE NANOSTRUCTURE; ULTRA-VIOLET;

BIOSENSORS; MOLDS; NANOIMPRINT LITHOGRAPHY; PHOTONIC CRYSTALS; TIN; TIN DIOXIDE;

NANOSTRUCTURES;

EID: 84861430686     PISSN: 19448244     EISSN: 19448252     Source Type: Journal    
DOI: 10.1021/am300203g     Document Type: Article

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