Stochastic exposure kinetics of EUV photoresists: A simulation study

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7969, Issue , 2011, Pages

  Mack, Chris A ^a   Thackeray, James W ^b   Biafore, John J ^c   Smith, Mark D ^c  

^a Lithogurucom   (United States)

^b Dow Electronic Materials   (United States)

^c KLA Tencor Austin   (United States)

Author keywords

EUV photoresist; exposure kinetics; LER; line edge roughness; linewidth roughness; LWR; Stochastic modeling

Indexed keywords

EUV PHOTORESIST; EXPOSURE KINETICS; LER; LINE EDGE ROUGHNESS; LINEWIDTH ROUGHNESS; LWR; STOCHASTIC MODELING;

CONCENTRATION (PROCESS); PHOTORESISTS; RATE CONSTANTS; ROUGHNESS MEASUREMENT; STATISTICS; STOCHASTIC SYSTEMS; SURFACE TREATMENT;

STOCHASTIC MODELS;

EID: 79957957681     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.881066     Document Type: Conference Paper

References (12)

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2. F. H. Dill, W. P. Hornberger, P. S. Hauge, and J. M. Shaw, "Characterization of Positive Photoresist," IEEE Trans. Electron Devices, 22 (7), pp. 445-452 (July, 1975).
3. C. A. Mack, "Absorption and Exposure in Positive Photoresist," Applied Optics, 27 (23), pp. 4913-4919 (1 Dec. 1988).
4. J. Biafore, M. Smith, E. Setten, T. Wallow, P. Naulleau, D. Blankenship, S. Robertson, Y. Deng, "Resist pattern prediction at EUV", Proc. SPIE, 7636, p. 76360R-1 (2010).
5. Chris A. Mack, Fundamental Principles of Optical Lithography: The Science of Microfabrication, J. Wiley & Sons (London, 2007), p. 195-197.
6. Chris A. Mack, Fundamental Principles of Optical Lithography: The Science of Microfabrication, J. Wiley & Sons (London, 2007), p. 245. An error in the first and second printing of this book gives a slightly incorrect version of equation (6.70) on page 245. The error is corrected when the equation is reproduced in this paper.
7. Chris Mack, "A Simple Model of Line-Edge Roughness", Future Fab International, Vol. 34 (July 14, 2010).
8. James W. Thackeray, Roger A. Nassar, Robert Brainard, Dario Goldfarb, Thomas Wallow, Yayi Wei, Jeff Mackey, Patrick Naulleau, Bill Pierson, and Harun H. Solak, "Chemically amplified resists resolving 25 nm 1:1 line-space features with EUV lithography", Proc. SPIE, 6517, p. 651719 (2007).
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10. M. Thiyagarajan, K. Dean, K. Gonsalves, "Improved Lithographic Performance for EUV resists based on Polymers with Photoacid Generators in the Backbone", J. Photopolym. Sci Tech., 18 (6), pp. 737-741 (2005).
11. Robert D. Allen, Phillip J. Brock, Young-Hye Na, Mark H. Sherwood, Hoa D. Truong, Gregory M. Wallraff, Masaki Fujiwara and Kazuhiko Maeda, "Investigation of Polymer-bound PAGs: Synthesis, Characterization and Initial Structure/Property Relationships of Anion-bound Resists", J. Photopolym. Sci. Tech., 22 (1), pp. 25-31 (2009).
12. Joonhee Han, Jung Hoon Oh, Hyun Sang Joo, Hyun Soon Lim, Seung Duk Cho, Jin Bong Shin, So Jung Park, Dong Chul Seo, "Studies of Acid Diffusion of Anionic or Cationic Polymer Bound PAG", presented at EUV Symposium 2010, Chiba Japan (2010).