Thermal conductivity of ZnO thin film produced by reactive sputtering

Journal of Applied Physics

Volumn 111, Issue 8, 2012, Pages

  Xu, Yibin ^a   Goto, Masahiro ^a   Kato, Ryozo ^a   Tanaka, Yoshihisa ^a   Kagawa, Yutaka ^a  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITE MODELS; CRYSTAL GRAINS; ELECTRONIC MICROSCOPY; GRAIN DIAMETER; GRAIN SIZE; INTERFACIAL LAYER; OXYGEN CONTENT; OXYGEN PARTIAL PRESSURE; PHONON DIFFUSION; ROOM TEMPERATURE; SPUTTERING GAS; THERMAL CONDUCTANCE; TWO LAYERS; UPPER LAYER; ZNO; ZNO FILMS; ZNO THIN FILM;

GRAIN BOUNDARIES; METALLIC FILMS; OPTICAL FILMS; PARTIAL PRESSURE; POSITIVE IONS; ZINC OXIDE;

THERMAL CONDUCTIVITY;

EID: 84860502661     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4706569     Document Type: Article

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