Deposition of ultrathin parylene C films in the range of 18 nm to 142 nm: Controlling the layer thickness and assessing the closeness of the deposited films

Thin Solid Films

Volumn 520, Issue 15, 2012, Pages 4884-4888

  Rapp, Bastian E ^a   Voigt, Achim ^a   Dirschka, Marian ^a   Länge, Kerstin ^a  

^a KARLSRUHE INSTITUTE OF TECHNOLOGY   (Germany)

Author keywords

Parylene C; Poly(para xylylene); Thin film coating; Ultrathin films

Indexed keywords

DEPOSITED FILMS; DEPOSITION PROCESS; DEPOSITION SYSTEMS; LAYER THICKNESS; PARYLENE C; PARYLENES; PLANAR ELECTRODE; POLY(PARA-XYLYLENE); REAL TIME; ROBUST METHODS; THIN-FILM COATINGS; ULTRA-THIN; ULTRATHIN LAYERS;

PROTECTIVE COATINGS;

ULTRATHIN FILMS;

EID: 84860306305     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2012.03.035     Document Type: Article

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