Development of an end-point detector for parylene deposition process

Journal of Microelectromechanical Systems

Volumn 12, Issue 1, 2003, Pages 64-69

  Sutomo, Wongso ^a   Wang, Xuefeng ^a   Bullen, David ^a   Braden, Sarah K ^b   Liu, Chang ^c  

^a University of Illinois at Urbana Champaign   (United States)

^b Stanford University   (United States)

^c Micro and Nanotechnology Laboratory   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DIMERS; SEMICONDUCTING POLYMERS; SUBLIMATION; THICK FILMS; THICKNESS CONTROL;

END POINT DETECTOR; PARYLENE DEPOSITION SYSTEMS; SOLID PHASE DIMER;

MICROELECTROMECHANICAL DEVICES;

EID: 0037302460     PISSN: 10577157     EISSN: None     Source Type: Journal    
DOI: 10.1109/JMEMS.2002.807473     Document Type: Article

References (7)

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