Texture optimization process of ZnO:Al thin films using NH4Cl aqueous solution for applications as antireflective coating in thin film solar cells

Thin Solid Films

Volumn 520, Issue 14, 2012, Pages 4698-4702

  Fernandez S ^a   Gandia J J ^a  

^a CIEMAT   (Spain)

Author keywords

Antireflection coating; NH4Cl etching process; RF magnetron sputtering; Thin film solar cell; ZnO:Al

Indexed keywords

ANTI REFLECTIVE COATINGS; AS-DEPOSITED FILMS; CL-CONCENTRATIONS; ETCH PARAMETERS; ETCHANT CONCENTRATIONS; ETCHING PROCESS; ETCHING RATE; ETCHING TIME; FILM ROUGHNESS; FLOAT ZONES; LAYER THICKNESS; OPTIMIZATION PROCESS; RADIO FREQUENCY MAGNETRON SPUTTERING; REFLECTANCE VALUES; RF-MAGNETRON SPUTTERING; SI WAFER; TEXTURED FILMS; THIN FILM SOLAR CELLS; ZNO; ZNO:AL FILMS; ZNO:AL THIN FILMS;

ALUMINUM; ANTIREFLECTION COATINGS; COATINGS; ELECTRIC PROPERTIES; MAGNETRON SPUTTERING; OPTIMIZATION; SILICON WAFERS; WET ETCHING; ZINC OXIDE;

THIN FILMS;

EID: 84860293916     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2011.10.132     Document Type: Conference Paper

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