Oxygen plasma assisted end-opening and field emission enhancement in vertically aligned multiwall carbon nanotubes

Materials Chemistry and Physics

Volumn 134, Issue 1, 2012, Pages 425-429

  Mathur, A ^a   Roy, S S ^b   Hazra, K S ^c   Wadhwa, S ^a   Ray, S C ^d   Mitra, S K ^b   Misra, D S ^c   McLaughlin, J A ^a  

^a UNIVERSITY OF ULSTER   (United Kingdom)

^b UNIVERSITY OF ALBERTA   (Canada)

^c INDIAN INSTITUTE OF TECHNOLOGY BOMBAY   (India)

^d UNIVERSITY OF THE WITWATERSRAND   (South Africa)

Author keywords

Field emission; Nanostructures; Plasma etching; Raman spectroscopy; Surface properties

Indexed keywords

ELECTRON FIELD EMISSION; EMISSION ENHANCEMENT; FIELD EMISSION PROPERTY; FILTERING ELEMENTS; HYDROPHOBIC NATURE; LOW POWER; MICRO-STRUCTURAL; MICROSTRUCTURAL CHANGES; NANOTUBE MORPHOLOGY; OXYGEN PLASMA TREATMENTS; OXYGEN PLASMAS; TRANSMISSION ELECTRON MICROSCOPY IMAGES; VERTICALLY ALIGNED; VERTICALLY ALIGNED CARBON NANOTUBE;

CARBON NANOTUBES; CONTACT ANGLE; DISPLAY DEVICES; ELECTRIC FIELDS; FIELD EMISSION; NANOSTRUCTURES; PLASMA APPLICATIONS; PLASMA ETCHING; RAMAN SCATTERING; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SURFACE PROPERTIES; TRANSMISSION ELECTRON MICROSCOPY;

OXYGEN;

EID: 84860227952     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matchemphys.2012.03.012     Document Type: Article

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