A method for extending depth of focus in STED nanolithography

Journal of Optics

Volumn 14, Issue 4, 2012, Pages

  Hao, Xiang ^a   Kuang, Cuifang ^a   Li, Yanghui ^a   Liu, Xu ^a  

^a ZHEJIANG UNIVERSITY   (China)

Author keywords

interference; lithography; microscopy; phase shift; polarization; superresolution

Indexed keywords

DIFFRACTION; LITHOGRAPHY; MICROSCOPIC EXAMINATION; NANOLITHOGRAPHY; PHASE SHIFT; POLARIZATION; WAVE INTERFERENCE;

CONVENTIONAL APPROACH; CYLINDRICAL POLARIZATION; DEPTH OF FOCUS; DIFFRACTION LIMITS; INTEGRATED UTILIZATION; INTERFERENCE EFFECTS; SUPER RESOLUTION; THEORETICAL APPROACH;

LIGHT POLARIZATION;

EID: 84859592948     PISSN: 20408978     EISSN: 20408986     Source Type: Journal    
DOI: 10.1088/2040-8978/14/4/045702     Document Type: Article

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