Fabrication of black multicrystalline silicon surface by nanosecond laser ablation

Applied Physics B: Lasers and Optics

Volumn 105, Issue 3, 2011, Pages 545-550

  Zuev, D A ^a   Novodvorsky, O A ^a   Khaydukov, E V ^a   Khramova, O D ^a   Lotin, A A ^a   Parshina, L S ^a   Rocheva, V V ^a   Panchenko, V Y ^a   Dvorkin, V V ^b   Poroykov, A Y ^b   Untila, G G ^b   Chebotareva, A B ^b   Kost, T N ^b   Timofeyev, M A ^b  

^a INSTITUTE ON LASER AND INFORMATION TECHNOLOGIES   (Russian Federation)

^b MOSCOW STATE UNIVERSITY   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL ETCHING; MULTI-CRYSTALLINE SILICON; MULTICRYSTALLINE SILICON (MC-SI); NANOSECOND LASER ABLATION; REFLECTANCE SPECTRUM; REFLECTIVE PROPERTIES; SPECTRAL REGION;

CHEMICAL ANALYSIS; REFLECTION;

POLYSILICON;

EID: 84859566960     PISSN: 09462171     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00340-011-4625-x     Document Type: Conference Paper

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