Fabrication and characterization of squama-shape micro/nano multi-scale silicon material

Science China Technological Sciences

Volumn 55, Issue 12, 2012, Pages 3395-3400

  Zhang, Xiao Sheng ^a   Zhu, Fu Yun ^a   Sun, Guang Yi ^b   Zhang, Hai Xia ^a  

^a PEKING UNIVERSITY   (China)

^b UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Deep reactive ion etching (DRIE); Multi scale structures; Silicon; Squama shape hierarchical structure

Indexed keywords

ASPECT RATIO; DEPOSITION; LITHOGRAPHY; MICROSTRUCTURE; NANOPILLARS; OPTICAL PROPERTIES; POTASSIUM HYDROXIDE; REACTIVE ION ETCHING; SILICON; THIN FILMS; WET ETCHING;

DEEP REACTIVE ION ETCHING; FABRICATION AND CHARACTERIZATIONS; FABRICATION PROCESS; HIERARCHICAL STRUCTURES; HIGH ASPECT RATIO; HORIZONTAL SURFACES; MULTI-SCALE STRUCTURES; STRUCTURAL PARAMETER;

FABRICATION;

EID: 84859556065     PISSN: 16747321     EISSN: 18691900     Source Type: Journal    
DOI: 10.1007/s11431-012-4853-2     Document Type: Article

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