Fabrication of hierarchical micro/nanostructures via scanning probe lithography and wet chemical etching

Ultramicroscopy

Volumn 108, Issue 10, 2008, Pages 1205-1209

  Choi, Inhee ^a   Kim, Younghun ^b   Yi, Jongheop ^a  

^a Seoul National University   (South Korea)

^b Kwangwoon University   (South Korea)

Author keywords

Atomic force microscopy (AFM); Scanning probe lithography (SPL); Silicon structure; Wet etching

Indexed keywords

ASPECT RATIO; CONSERVATION; ETCHING; FABRICATION; LITHOGRAPHY; MICROSTRUCTURE; NITRIDES; NONMETALS; OPTICAL DESIGN; PASSIVATION; PHOTORESISTS; SCANNING; SILICA; SILICON COMPOUNDS; SILICON NITRIDE; SOIL CONSERVATION; THREE DIMENSIONAL; TWO DIMENSIONAL;

ATOMIC FORCE MICROSCOPY (AFM); ETCHING PROCESSES; HIGH ASPECT RATIOS; LOCAL OXIDATION; MICRO/NANOSTRUCTURES; SCANNING PROBE LITHOGRAPHY; SCANNING PROBE LITHOGRAPHY (SPL); SILICON OXIDES; SILICON STRUCTURE; SILICON STRUCTURES; SILICON SURFACE; SILICON-BASED STRUCTURES; THREE-DIMENSIONAL MICROSTRUCTURES; TIP-INDUCED; WET-CHEMICAL ETCHING;

WET ETCHING;

NANOMATERIAL; OXIDE; SILICON;

ANISOTROPY; ARTICLE; ATOMIC FORCE MICROSCOPY; OXIDATION; SCANNING PROBE MICROSCOPY;

EID: 49949093127     PISSN: 03043991     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ultramic.2008.04.076     Document Type: Article

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