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Journal of Applied Physics

Volumn 110, Issue 11, 2011, Pages

Dynamics of solidification in Al thin films measured using a nanocalorimeter

(3) Swaminathan, P a,b Lavan, D A b Weihs, T P a

a Johns Hopkins University (United States)

b NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AL THIN FILMS; COOLING RATES; DIRECT MEASUREMENT; ENTHALPY CHANGE; HEAT EXTRACTION; MELTING AND SOLIDIFICATION; MODEL SYSTEM; NUCLEATION CENTER; NUMERICAL STRATEGIES; PHYSICAL MEASUREMENT; RATE OF HEAT RELEASE; TEMPERATURE RISE;

DYNAMICS; ENTHALPY; RAPID SOLIDIFICATION;

THIN FILMS;

EID: 84859341958 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.3668128 Document Type: Article

Times cited : (21)

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