Digital memory behaviors of aromatic polyimides bearing bis(trifluoromethyl)- and bithiophenyl-triphenylamine units

Polymer

Volumn 53, Issue 8, 2012, Pages 1703-1710

  Kim, Dong Min ^a   Ko, Yong Gi ^a   Choi, Jun Keol ^b   Kim, Kyungtae ^a   Kwon, Wonsang ^a   Jung, Jungwoon ^a   Yoon, Tae Ho ^b   Ree, Moonhor ^a  

^a Pohang University of Science and Technology (POSTECH)   (South Korea)

^b Gwangju Institute of Science and Technology (GIST)   (South Korea)

Author keywords

Electrical memory polyimides; Electron accepting Bis(trifluoromethyl)phenyl group; Electron donating bithiophene group

Indexed keywords

AROMATIC COMPOUNDS; ELECTRONS; INTERFACES (MATERIALS); POLYIMIDES; STATIC RANDOM ACCESS STORAGE; THERMIONIC EMISSION;

BITHIOPHENES; ELECTRICAL MEMORY; HIGH MOLECULAR WEIGHT; LOW-POWER CONSUMPTION; MORPHOLOGICAL STRUCTURES; TRIFLUOROMETHYL; TRIPHENYLAMINE DERIVATIVES; WRITE-ONCE READ-MANY-TIMES;

DYNAMIC RANDOM ACCESS STORAGE;

EID: 84859056649     PISSN: 00323861     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.polymer.2012.02.043     Document Type: Article

References (64)

1. C.U. Pinnow, and T. Mikolajick J Electrochem Soc 151 2004 K13
2. Z. Donhauser, B. Mantooth, K. Kelly, L. Bumm, J. Monnell, and J. Stapleton Science 292 2001 2303
3. S. Baek, D. Lee, J. Kim, S.H. Hong, O. Kim, and M. Ree Adv Funct Mater 17 2007 2637
4. J.C. Scott, and L.D. Bozano Adv Mater 19 2007 1452
5. D. Ma, M. Aguiar, J.A. Freire, and I.A. Hümmelgen Adv Mater 12 2000 1063
6. H. Henisch, J. Meyers, R. Callarotti, and P. Schmidt Thin Solid Films 51 1978 265
7. Q. Ling, Y. Song, S.J. Ding, C. Zhu, D.S.H. Chan, and D.L. Kwong Adv Mater 17 2005 455
8. T.J. Lee, S. Park, S.G. Hahm, D.M. Kim, K. Kim, and J. Kim J Phys Chem C 113 2009 3855
9. S. Park, T.J. Lee, D.M. Kim, J.C. Kim, K. Kim, and W. Kwon J Phys Chem B 114 2010 10294
10. J.H.A. Smits, S.C.J. Meskers, R.A.J. Janssen, A.W. Marsman, and D.M. de Leeuw Adv Mater 17 2005 1169
11. D. Lee, S. Baek, M. Ree, and O. Kim IEEE Electron Device Lett 29 2008 694
12. S.H. Hong, O. Kim, S. Choi, and M. Ree Appl Phys Lett 91 2007 093517
13. D. Lee, S. Baek, M. Ree, and O. Kim Jpn J Appl Phys 47 2008 5665
14. D. Lee, S. Baek, M. Ree, and O. Kim Electronics Lett 44 2008 596
15. T.J. Shin, and M. Ree J Phys Chem B 111 2007 13894
16. M. Ree Macromol Res 14 2006 1
17. J. Wakita, S. Jin, T.J. Shin, M. Ree, and S. Ando Macromolecules 43 2010 1930
18. S.G. Hahm, T.J. Lee, and M. Ree Adv Funct Mater 17 2007 1359
19. S.G. Hahm, T.J. Lee, T. Chang, J.C. Jung, W.C. Zin, and M. Ree Macromolecules 39 2006 5385
20. S.G. Hahm, S.W. Lee, T.J. Lee, S.A. Cho, B. Chae, and Y.M. Jung J Phys Chem B 112 2008 4900
21. T.J. Shin, and M. Ree Langmuir 21 2005 6081
22. S.W. Lee, S.J. Lee, S.G. Hahm, T.J. Lee, B. Lee, and B. Chae Macromolecules 38 2005 4331
23. S.W. Lee, S.I. Kim, B. Lee, H.C. Kim, T. Chang, and M. Ree Langmuir 19 2003 10381
24. B. Chae, S.W. Lee, B. Lee, W. Choi, S.B. Kim, and Y.M. Jung J Phys Chem B 107 2003 11911
25. B. Chae, S.W. Lee, B. Lee, W. Choi, S.B. Kim, and Y.M. Jung Langmuir 19 2003 9459
26. S.W. Lee, S.I. Kim, B. Lee, W. Choi, B. Chae, and S.B. Kim Macromolecules 36 2003 6527
27. S.W. Lee, B. Chae, B. Lee, W. Choi, S.B. Kim, and S.I. Kim Chem Mater 15 2003 3105
28. T. Shin, H. Park, S. Lee, B. Lee, W. Oh, and J.S. Kim Polym Eng Sci 43 2003 1232
29. B. Chae, S.B. Kim, S.W. Lee, S.I. Kim, W. Choi, and B. Lee Macromolecules 35 2002 10119
30. T.J. Shin, and M. Ree Macromol Chem Phys 203 2002 791
31. T.J. Shin, B. Lee, H.S. Youn, K.B. Lee, and M. Ree Langmuir 17 2001 7842
32. S.W. Lee, T. Chang, and M. Ree Macromol Rapid Commun 22 2001 941
33. Q.D. Ling, F.C. Chang, Y. Song, C.X. Zhu, D.J. Liaw, and D.S.H. Chan J Am Chem Soc 128 2006 8732
34. D.M. Kim, S. Park, T.J. Lee, S.G. Hahm, K. Kim, and J.C. Kim Langmuir 25 2009 11713
35. S. Park, K. Kim, D.M. Kim, W. Kwon, J. Choi, and M. Ree ACS Appl Mater Interfaces 3 2011 765
36. S. Park, K. Kim, J.C. Kim, W. Kwon, D.M. Kim, and M. Ree Polymer 52 2011 2170
37. S.G. Hahm, S. Choi, S.H. Hong, T.J. Lee, S. Park, and D.M. Kim Adv Funct Mater 18 2008 3276
38. S.G. Hahm, S. Choi, S.H. Hong, T.J. Lee, S. Park, and D.M. Kim J Mater Chem 19 2009 2207
39. K. Kim, S. Park, S.G. Hahm, T.J. Lee, D.M. Kim, and J.C. Kim J Phys Chem B 113 2009 9143
40. T.J. Lee, C.W. Chang, S.G. Hahm, K. Kim, S. Park, and D.M. Kim Nanotechnology 20 2009 135204
41. S.G. Hahm, S. Choi, S.H. Hong, T.J. Lee, S. Park, and D.M. Kim Adv Funct Mater 18 2008 3276
42. D.M. Kim, S. Park, T.J. Lee, S.G. Hahm, K. Kim, and J.C. Kim Langmuir 25 2009 11713
43. K. Kim, S. Park, S.G. Hahm, T.J. Lee, D.M. Kim, and J.C. Kim J Phys Chem B 113 2009 9143
44. S.G. Hahm, S. Choi, S.H. Hong, T.J. Lee, S. Park, and D.M. Kim J Mater Chem 19 2009 2207
45. J.K. Choi, K. Cho, and T.H. Yoon Synth Met 160 2010 1938
46. J. Bolze, M. Ree, H.S. Youn, S.H. Chu, and K. Char Langmuir 17 2001 6683
47. Y. Hwang, K. Heo, C.H. Chang, M.K. Joo, and M. Ree Thin Solid Films 510 2006 159
48. J. Bolze, J. Kim, J.Y. Huang, S. Rah, H.S. Youn, and B. Lee Macromol Res 10 2002 2
49. F. Salah, B. Harzallah, and A. van der Lee J Appl Crystallogr 40 2007 813
50. J. Yoon, K.W. Kim, J. Kim, K. Heo, K.S. Jin, and S. Jin Macromol Res 16 2008 575
51. B. Lee, Y.H. Park, Y.T. Hwang, W. Oh, J. Yoon, and M. Ree Nat Mater 4 2005 147
52. B. Lee, W. Oh, Y. Hwang, Y.H. Park, J. Yoon, and K. Jin Adv Mater 17 2005 696
53. J. Yoon, K.S. Jin, H.C. Kim, G. Kim, K. Heo, and S. Jin J Appl Crystallogr 40 2007 476
54. J. Yoon, S.W. Lee, S. Choi, K. Heo, K.S. Jin, and S. Jin J Phys Chem B 112 2008 5338
55. G. Kim, S. Park, J. Jung, K. Heo, J. Yoon, and H. Kim Adv Funct Mater 19 2009 1631
56. L.G. Parratt Phys Rev 95 1954 359
57. P. Mark, and W. Helfrich J Appl Phys 33 1962 205
58. A. Campbell, D. Bradley, and D. Lidzey J Appl Phys 82 1997 6326
59. K.L. Jensen J Vac Sci Technol B 21 2003 1528
60. J. Frenkel Phys Rev 54 1938 647
61. C. Laurent, E. Kay, and N. Souag J Appl Phys 64 1988 336
62. J. Kim, S. Cho, S. Choi, S. Baek, D. Lee, and O. Kim Langmuir 23 2007 9024
63. S. Choi, S.H. Hong, S.H. Cho, S. Park, S.M. Park, and O. Kim Adv Mater 20 2008 1766
64. H. Gao, K. Sohlberg, Z. Xue, H. Chen, S. Hou, and L. Ma Phys Rev Lett 84 2000 1780