Patterning of wave guides in LiNbO3 using ion beam etching and reactive ion beam etching

Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films

Volumn 20, Issue 3, 2002, Pages 1072-1075

  Hines, D S ^a   Williams, K E ^a  

^a VEECO INSTRUMENTS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ION BEAMS; OPTOELECTRONIC DEVICES; PATTERN RECOGNITION; PHOTORESISTS; REACTIVE ION ETCHING; SCANNING ELECTRON MICROSCOPY; WAVEGUIDES;

ION BEAM ETCHING; PHOTORESIST MASK; REACTIVE ION BEAM ETCHING;

LITHIUM NIOBATE;

EID: 0036565394     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1472425     Document Type: Article

References (6)